Network search method in the design of extreme ultraviolet lithographic objectives

Journal article (2007)

Authors

O. Marinescu

F. Bociort

Department

Imaging Science and Technology () (TU Delft)

DOI: https://doi.org/doi:10.1364/AO.46.008385

Lithography Systems design Geometric optical design Lens system design Optical design and fabrication

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Published Date

03-12-2007

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Source:

Applied Optics, 46 (35), 2007

Faculty

Applied Sciences

Department

Imaging Science and Technology

Abstract

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when control parameters, such as aperture and field, are varied, and constraints are used to limit the variation domain of the variables. A good solution in a network, obtained with a limited number of variables, has been locally optimized with all variables to meet practical requirements.

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