Optimization of a plasma etching machine for failure analysis of semiconductors

Master thesis (2023)

Authors

B. Xu Electrical Engineering, Mathematics and Computer Science

Contributors

Kouchi Zhang Electronic Components, Technology and Materials - (mentor)

K.M. Dowling Electronic Instrumentation - (graduation committee member)

Jiaqi Tang (coach)

Faculty

Electrical Engineering, Mathematics and Computer Science, Electrical Engineering, Mathematics and Computer Science

Microwave induced plasma(MIP) Afterglow plasma etching Beenakker cavity Etching selectivity Decapsulation Etching recipe

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Published Date

21-09-2023

Language

English

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Faculty

Electrical Engineering, Mathematics and Computer Science

Abstract

Microwave Induced Plasma (MIP) is an advanced decapsulation tool developed by Jiaco Instruments. The goal of this thesis is to optimise the current MIP system. There are two directions: 1. Improve the etching rate. 2. Find selectivity between different materials (Si, SiO2, SiN). The experiments are divided into two parts in total, improved cavity and CF4-based MIP machine etching selectivity experiment. The cavity experimental results demonstrate that high input power is the route to optimising MIP efficiency. Etch experiments demonstrate that the CF4/O2 gas recipe is effective in achieving etch selectivity and that temperature is a key factor influencing these etch selectivities.

Files

Thesis_Bingyan_Xu.pdf

File under embargo until 31-12-2025