This study investigates the size-dependent mechanical behavior and deformation mechanisms of sintered copper (Cu) nanoparticles (NPs) through micro-pillar (2–6 μm diameter) compression tests, scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) analysis and molecular dynamics (MD) simulations. In-situ micro-pillar compression tests reveal a 25.9% reduction in yield strength (812 ± 64 MPa to 643 ± 47 MPa) with increasing pillar size, attributed to dislocation starvation in smaller pillars and porosity-driven strain localization in larger ones. TKD quantifies dynamic grain refinement (24.9% reduction in grain size) and geometrically necessary dislocation (GND) density escalation (74.8%), driven by stress gradients and grain boundary-mediated plasticity. Nanoindentation-derived elastic modulus (48.3 ± 11.1 GPa) exceeds micropillar values (29.5–33.9 GPa), reflecting substrate constraints in bulk testing. Microstructural analysis identifies a transition from shear banding in high-porosity pillars to uniform plasticity in denser systems, mediated by texture evolution (Brass/S components) and Schmid factor redistribution (62% increase in high-slip-activity grains). MD simulations of pressure-sintered Cu NPs elucidate atomic-scale mechanisms: dislocation nucleation at sintering necks, pore collapse-induced strain localization, and grain boundary sliding. These findings establish a multiscale framework linking porosity, grain refinement, and dislocation dynamics to mechanical performance, emphasizing microstructural optimization for enhanced reliability in microelectronic applications. The integration of MD simulations bridges atomic-scale mechanisms to microscale deformation, providing actionable insights for tailoring sintered Cu NPs via reduced porosity and controlled grain boundary architectures.

The use of microRNAs as clinical cancer biomarkers is hindered by the absence of accurate, sensitive and rapid assays for their detection in biofluids. Here we report a biosensing approach, SpLig-HEMT, that combines an RNA splint-ligation reaction with an AlGaN/GaN high-electron-mobility transistor biosensor for ultrasensitive miRNA detection. In this system, HEMT functions as a highly effective voltage amplifier to enhance detection sensitivity, while the splint-ligation reaction ensures precise discrimination of single-nucleotide mutations. By detecting miRNA-21, the SpLig-HEMT biosensor achieves an exceptional limit of detection of 10⁻¹⁸ M within 30 min, with a dynamic range from 10⁻¹⁸ M to 10⁻¹³ M. No detectable response is observed for one-mismatch miR-21. Furthermore, the SpLig-HEMT biosensor enables direct analysis of blood serum samples, effectively distinguishing between healthy individuals and patients with ovarian cancer. This study addresses critical challenges in miRNA detection and presents a promising tool for cancer diagnosis and prognosis.

This paper investigates the effects of three ageing factors (chemical, humidity, and temperature) and their interactions on the physical properties and degradation of silicone sealant used in microelectronic applications. The thermal degradation of silicone sealants was investigated by exposing samples to temperatures in the range of 150 up to 175 °C. Also, a set of samples were aged at 40 °C in a salt spray set-up with 100 % humidity in a salty atmosphere. Results showed detectable changes in the FTIR spectra of aged specimen as compared with the as-received sample. In all accelerated testing conditions, peak intensities decreased with ageing time, inferring that that the surface characteristics of the sealant is affected by ageing. Shear test results showed that with increasing the ageing time, the maximum shear stress in most cases has decreased in all ageing conditions. Also, it appears that samples with longer ageing times have experienced more elongation before failure. Results also show that salt spraying of specimens is associated with a decrease in the mechanical properties of the sealant, indicating the deleterious implications of ionic contaminations for the mechanical properties of samples.

Silicon-Carbide (SiC) MOSFETs are widely used in high-power and high-efficiency applications such as electric vehicles and power supplies. However, long-term reliability remains a critical concern, particularly under extreme operating conditions. This work aims to explain the health monitoring of SiC metal oxide-semiconductor field effect transistors (MOSFETs) through precise junction temperature (T_j) profiling based on performed measurements. The study focuses on the temperature-dependent behavior of the on-resistance (RDS(on)), a key parameter that varies with the aging, degradation, and temperature of the device. By systematically measuring R_DS(on) at different temperatures and at various stages of the operating life of the device, we can establish a predictive model to assess the health of SiC MOSFETs. The importance of pulse duration of the drain current is stressed to avoid the self-heating effect with some device physics insights. The proposed methodology enables better understanding of the SiC MOSFET performance for future real-time condition monitoring, facilitating early failure detection and lifetime estimation. This approach provides valuable information for improving reliability and optimizing maintenance strategies in power electronics systems. Experimental results validate the effectiveness of the proposed method and give direction for future research opportunities.

High-energy Al ion implantation is an indispensable technique for achieving precise doping in fabricating 4H‑SiC devices. However, it inevitably introduces interfacial damage and residual stress that can compromise subsequent manufacturing processes and device reliability. Conventional destructive characterization techniques cannot provide real-time, in‑situ, nondestructive monitoring under process conditions, creating a major bottleneck in quality control. Here, we establish a predictive modeling framework that integrates multiscale simulations with advanced, non‑destructive micro‑Raman spectroscopy to systematically investigate the evolution of high-energy Al ion implantation–induced interface defects and residual stress in 4H-SiC. Simulation results reveal a linear relationship between the implantation dose and the formation of vacancies and interstitial defects, while the stress accumulation tends to saturate at higher doses due to a dynamic equilibrium among defect interactions. Complementary micro‐Raman spectroscopy corroborates the simulations, showing that the damaged interface layer deepens from approximately 300 nm at a dose of 1014 ions cm−2 to nearly 500 nm at 1016 ions cm−2, consistent with Monte Carlo predictions. Furthermore, the molecular dynamics simulations capture a trend of the implantation stress evolution with strong concurrence with the Raman-measured residual stress. This combined computational–experimental approach elucidates the fundamental mechanisms governing defect formation and residual stress in ion‑implanted 4H‑SiC, establishes implantation dose as the pivotal role of 4H-SiC in defect density and residual stress, and underscores the utility of optical‑based characterization in real‑time, non‑invasive quality control for advanced manufacturing.

The study focuses on the optical and electrical properties of Tungsten Ditelluride (WTe2), a type II Weyl semimetal, as well as the influence of its self-limiting oxide (SLO) layer that forms during natural oxidation. WTe2 exhibits promising applications in photodetection and energy harvesting due to its unique gapless linear dispersion and Berry-field-enhanced nonlinear optical effects. However, surface oxidation poses a challenge as it degrades the performance of WTe2. By employing spectroscopic ellipsometry and Raman spectroscopy, the progression of the oxide layer’s thickness and its impact on the optical constants of WTe2 were examined. The results revealed a rapid increase in oxide thickness within the first 24 h, and it reached saturation at ∼10 nm after 45 h of atmospheric exposure. Electrical properties were explored using Kelvin Probe Force Microscopy, uncovering a modification in surface potential and Fermi level following oxidation. Additionally, a SLO/WTe2 heterojunction device exhibited a wide region of positive and negative coexisting photocurrent, highlighting the potential for logical operations in ambient air. Finally, the mechanism of operation of the device is discussed. The electrical and optical properties of the pristine, partially oxidized and fully oxidized WTe2 are analyzed using density functional theory calculations. It shows that the SLO layer has a significant effect on the optical and electronic properties, which is instructive for future wavelength-modulated device optoelectronic logic operations.

Triboelectric nanogenerator (TENG), advantageous in high energy density and flexibility, is promising as a sustainable energy source but can hardly be used to power edge devices directly due to its high-voltage AC output and varying capacitive impedance. To address it, this work proposes a power-conditioning interface with a fully integrated dual synchronous switch harvesting on capacitors (D-SSHC) rectifier for triboelectric energy extraction. Furthermore, a full digital duty-cycle-based (DCB) maximum power point tracking (MPPT) algorithm is developed to optimize the energy harvesting efficiency with simple implementation and continuous tracking. Designed and fabricated in a 0.18-μm BCD process, the proposed interface can extract energy at a maximum output voltage of 70 V. According to the measurement results, it achieves 99% MPPT efficiency and an energy extraction improvement of 598% compared to a full-bridge rectifier.

The mechanical strength of sintered nanoparticles (NPs) limits their application in advanced electronics packaging. In this study, we explore the anisotropy in the microstructure and mechanical properties of sintered copper (Cu) NPs by combining experimental techniques with molecular dynamics (MD) simulations. We establish a clear relationship between processing conditions, microstructural evolution, and resulting properties in pressure-assisted sintering of Cu NPs. Our findings reveal that pressure-assisted sintering induces significant anisotropy in the microstructure, as evidenced by variations in areal relative density and the orientation distribution of necks formed during sintering. Specifically, along the direction of applied pressure, the microstructure exhibits reduced variation in areal relative density and a higher prevalence of necks with favorable orientations. The resulting anisotropic mechanical properties, with significantly higher strength along the pressure direction compared to other directions, are demonstrated through micro-cantilever bending tests and tensile simulations. This anisotropy is further explained by the combined effects of strain localization (influenced by areal relative density) and the failure modes of necks (determined by their orientation relative to the loading direction). This work provides valuable insights into the analysis of sintered NPs microstructures and offers guidance for optimizing the sintering process.

Graphdiyne (GDY)/two-dimensional materials (2DMs) heterostructures present unique opportunities for advanced optoelectronic and neuromorphic devices because of their exceptional electrical, optical, and structural properties. However, the traditional methods for construction of GDY/2DMs heterostructures usually lead to inferior interfaces, which seriously affects the charge separation and transport. Herein, an in situ approach for growing GDY nanowalls (NWs) on WSe2 is employed in this work. The as-prepared GDY NWs/WSe2 heterostructure exhibits self-powered broadband photodetection across 405–980 nm with a high responsivity of 2176 A/W and detectivity of 3.6 × 1012 Jones at 532 nm under 0.02 mW/cm2 illumination, significantly outperforming previously reported GDY-based devices. The efficient charge separation and strong photocarrier trapping in the GDY NWs/WSe2 heterostructure result in pronounced short-term and long-term synaptic plasticity. The nonlinear, wavelength-dependent reservoir state separation enables clear distinction of multiple pulse sequences, which shows great potential for logic processing. The successfully resolved red, green, and violet patterns, and one-shot color image recognition of a 5-letter image highlight transformative potential of GDY NWs/WSe2 device for future adaptive imaging and neuromorphic computing technologies.

This Letter presents a combined analytical and experimental method to effectively decouple the radial and tangential residual stress fields induced by Berkovich nanoindentation in single-crystalline 4H-SiC using micro-Raman spectroscopy. By integrating the Raman stress characterization model with Yoffe’s expanding cavity model, precise extraction of individual residual stress components around the indentation region is realized. Through the vertical backscattering micro-Raman mapping of the E2 phonon mode, we systematically investigate the residual stress distribution near the indentation. The results highlight significant anisotropy in nanoindentation-induced stress fields, strongly dependent on the crystal orientation of 4H-SiC, predominantly featuring radial tensile stress gradients. This comprehensive theoretical–experimental approach offers a robust optical framework for residual stress characterization in 4H-SiC and provides foundational insights for extending Raman spectroscopy-based stress characterization to other crystalline materials and related device structures.

This study presents a novel approach for localized silver (Ag) nanoparticles (NPs) sintering using microheater arrays embedded within the Si substrate. By applying controlled pulse currents, these microheaters generate targeted heat pulses, enabling rapid and localized sintering while maintaining the surrounding device components at room temperature. This localized heating minimizes thermal stress caused by thermal expansion mismatches, as sintering completes within milliseconds. Compared to conventional sintering techniques, this method improves process efficiency, reduces power consumption, and provides precise spatial control over the sintered regions. The proposed approach offers a promising alternative for microelectronics packaging and integration, particularly in applications requiring precise thermal management.

In harsh offshore environments, large-area sintered nano-copper (Cu) interconnections, which serve as die attachment material or thermal interface material (TIM), are prone to degradation from hydrogen sulfide (H2S) corrosion. This study introduced a film-forming technique based on atmospheric pressure plasma jet (APPJ) to improve the corrosion resistance of large-area sintered nanoCu joint. The corrosion protection mechanism against H2S-containing atmospheric corrosion was investigated using both experimental methods and density functional theory (DFT) simulations. The key findings were as follows: (1) The deposition film, primarily composed of a Si-O3 network, effectively protected sintered Cu plate from corrosion by H2S gas, and maintaining the mechanical performance of sintered Cu joint after 384 h of H2S testing. (2) The dissociation products of the APPJ-treated precursor hexamethyldisiloxane (HMDSO), −OSiCH3 and −OSi(CH3)3, formed stable chemical bonds on the sintered nanoCu surface, resulting in the formation of −OSiCH3(O-CH3)2 fragments. (3) The −OSiCH3(O-CH3)2 fragments were unreactive toward to corrosion agents such as H2S, O2, and H2O, and also serving as a barrier to block their access to the sintered nanoCu surface. This study provided a comprehensive understanding of the corrosion protection mechanism of sintered nanoCu using APPJ-deposited films, offering valuable insights for improving the reliability of power electronics.

The degradation mechanisms of silicon carbide (SiC) VDMOSFET and trench metal oxide semiconductor field effect transistor (MOSFET) in a 60Co gamma irradiation environment were investigated. The degradation of electrical characteristics of SiC MOSFET in different working states after irradiation with different total ionizing doses (TIDs) was explored. The defects induced during the irradiation process were studied in annealing experiments conducted after irradiation. The reasons for the degradation of SiC MOSFET caused by TID were revealed, and a prediction model of threshold voltage (Vth) shift was proposed and verified through TCAD simulation. The Vth, breakdown voltage (BV), on-resistance R, input capacitance (Ciss), output capacitance Coss, and reverse transfer capacitance C _rss were measured at different irradiation doses and annealing conditions. Experimental results indicated that the degradation of both Ron and Ciss was primarily caused by the Vth shift. As the doses increased, the shift in Vth gradually reached saturation. Similar trends to VDMOSFET were observed in trench MOSFET but with greater sensitivity to TID. In addition, MOSFETs biased at zero voltage exhibited lower shifts in Vth compared with those under high gate bias conditions. Furthermore, the increase in defects in the gate oxide during irradiation and annealing processes were calculated. Finally, a model predicting Vth shift path was established, and its accuracy and limitations were determined. This study provides valuable insights into the effect of TID on SiC MOSFETs.

The three-step wet etching (TSWE) method has been proven to be a promising technique for fabricating silicon nanopores. Despite its potential, one of the bottlenecks of this method is the precise control of the silicon etching and etch-stop, which results in obtaining a well-defined nanopore size. Herein, we present a novel strategy leveraging electrochemical passivation to achieve accurate control over the silicon etching process. By dynamically controlling the oxide layer growth, rapid and reliable etch-stop was achieved in under 4 s, enabling the controllable fabrication of sub-10 nm silicon nanopores. The thickness of the oxide layer was precisely modulated by adjusting the passivation potential, achieving nanopore size shrinkage with a precision better than 2 nm, which can be further enhanced with more refined potential control. This scalable method significantly enhances the TSWE process, offering an efficient approach for producing small-size silicon nanopores with high precision. Importantly, the precise etching control facilitated by electrochemical passivation holds promise for the cost-effective production of high-density, air-insulated monolithic integrated circuits. (Figure presented.)

Optical micro-electromechanical systems (MEMS) demand exceptional precision, yet warpage during the die attach process on printed circuit boards can compromise performance. Here, a three-dimensional thermoelastic analytical model has been developed based on Fourier heat conduction and supported beam theory. This model facilitates the in-situ calibration of solder parameters via confocal micro-Raman spectroscopy, ensuring that the simulated dynamic evolution of warpage during soldering aligns closely with digital image correlation experiments. The results show consistence with Finite Element Method with error less than 1 % and time saving more than 60 %. Orthogonal experimental analysis further reveals that substrate thickness and thermal expansion coefficient variations are the primary factors affecting warpage, while chip area has a negligible role. Given the practical challenges in reducing substrate thickness, a stress-balancing strategy incorporating an additional transition layer is proposed, which is effectively validated with a high-resolution three-dimensional profilometer. This work provides valuable insights into the predictive modeling and warpage behavior characterization, directly supporting improved mitigation strategies in the die attach process.

With the miniaturization and high-power requirements of microelectronic devices, the current density carried by interconnects in packaging structures continually increases and reaches the threshold of electromigration (EM) failure. In this study, we investigated the microstructure evolution and void formation in aluminum (Al) interconnects during EM at three different current densities (1/3/5 MA/cm ²) and proposed a method coupling the fully coupled theory with an optimized atomic flux divergence method. The results show as follows. First, for the interconnects in integrated circuits, current density is the main factor affecting the EM lifetime of the interconnects in a certain temperature range. With the gradual increase of current density, the contribution of thermal transfer on EM cannot be ignored. The atomic concentration gradient and stress gradient can inhibit EM failure. Second, the increase of length and the decrease of width of interconnect will lead to the increase of atomic flux inside the structure, resulting in the accumulation of voids and atoms. Third, the structure is dynamically reconstructed after deleting the atoms below the failure threshold and the simulation results agree well with the experimental results. Compared with the traditional atomic flux divergence method, the improved atomic flux divergence method based on the fully coupled theory can better fit the change trend of atomic concentration after interconnect failure, and the failure time error is reduced by about 10%.

This article presents a novel in-package relative humidity (RH) sensor designed to enhance moisture detection within the chip encapsulation material, specifically epoxy molding compound (EMC). Traditional methods for assessing EMC moisture content, such as mass measurements, are time-consuming and incompatible with industrial reliability tests, limiting their use for real-time, in situ monitoring. To address these challenges, we propose an integrated capacitive sensor that directly measures moisture content within the encapsulation material. The sensor utilizes a heterogeneous electrode design to overcome the sensitivity limitations of conventional interdigital electrodes (IDEs). This design features sections of different widths, allowing selective wet chemical etching of the silicon dioxide layer using buffered hydrofluoric acid (BHF). By controlling the etching time, the silicon dioxide layer beneath the narrower sections is completely etched, while oxide pillars form under the wider sections, resulting in semifloating electrodes. The EMC fills the etched regions and wraps around the narrower sections, concentrating more electric field lines in the EMC and enhancing sensor sensitivity. Our proposed sensor achieves a capacitance change of 1 pF per 80% RH, improving sensitivity from 6.9 to 12.3 fF/%RH, with a 20% increase in relative capacitance change. A shielding layer is added to minimize parasitic capacitance effects, ensuring accurate measurements. The proposed sensor is fully CMOS-compatible and can monitor moisture-induced reliability risks, as well as assess packaging material aging. This work provides a cost-effective and reliable solution for in-package humidity monitoring in semiconductor applications.

Van der Waals heterojunctions (vdWHs) have garnered significant attention for their promising applications in optoelectronics, attributed to their exceptional physical attributes. In this study, we present a straightforward approach to fabricating high-performance vdWHs photodetectors. Specifically, we prepared WSO_x/WS₂ vdWH photodetectors through the ozone oxidation of a WS₂ thin films at 100 °C. To characterize the morphology and optical properties of both the WS₂ and WSO_x/WS₂ thin films, we utilized atomic force microscopy (AFM) and Raman spectroscopy. Additionally, X-ray photoelectron spectroscopy (XPS) was employed to delve into the structural evolution by scrutinizing the bonding states of W, O, and S in the WS₂ before and after the ozone oxidation process. The resultant WSO_x/WS₂ vdWH photodetectors exhibited impressive photoelectric performance at wavelengths of 475 nm and 532 nm. It demonstrated a high responsivity of 230.7 A/W, a remarkable specific detectivity of 1.794 × 10¹¹ Jones, and a swift response speed of 60 ms at 475 nm. Furthermore, first-principles calculations based on density functional theory (DFT) were conducted to validate the oxidation kinetics of monolayer WS₂, the type II energy band alignment, and the interlayer charge transfer within the WSO_x/WS₂ vdWH. This research contributes novel insights into the synthesis of two-dimensional transition metal oxides (TMOs)-transition metal dichalcogenides (TMDCs) heterostructures for photodetector applications.

In this study, we introduced a hybrid Potts-phase field model to simulate the co-evolution of grain growth and pores migration in sintered silver layers. The Potts model is good at capture the grain growth dynamics, while the phase field model describes the evolution of the porous network. These models are coupled via a hybrid free energy function to achieve a realistic representation of the microstructure evolution. This study further extends the hybrid model by incorporating (a) a flexible exchange interaction matrix to model the crystal anisotropy in grain growth, (b) Glauber or Kawasaki dynamics to describe different diffusion mechanisms, and (c) the effect of pinning sites, representing impurity-driven grain boundary stabilization. The computational framework is implemented using Taichi Lang, which allows for efficient parallel simulations. Results show that the model effectively captures the long-term evolution of the sintered silver microstructure in good agreement with experimental observations. This hybrid model is a powerful tool to predict microstructural reliability of sintered silver die attach layers, supporting material design and process optimization for high-power electronic applications.

This study investigates the microstructure evolution and mechanical behavior of bimodal-sized sintered copper (Cu) nanoparticles (NPs) under varying sintering pressures. Micro-pillar compression tests reveal a transition from collapse-dominated to compaction-driven deformation as sintering pressure increases. Transmission electron microscopy (TEM) and transmission Kikuchi diffraction (TKD) analyses identify a two-stage deformation mechanism—initial pore compaction followed by intragranular slip—fundamentally distinct from bulk Cu. Molecular dynamics (MD) simulations further reveal that large particles promote dislocation-mediated plasticity by accommodating intragranular slip, while small particles enhance load transfer through localized shear-compaction, together enabling uniform strain distribution and supporting the experimentally observed strain accommodation. The resulting microstructure achieves a combination of high yield strength (up to 320 MPa) and low elastic modulus (20 GPa), offering a compliant yet robust response. These findings elucidate a unique processing–structure–property relationship and provide a rational basis for designing porous metal interconnects capable of withstanding thermomechanical stresses in advanced electronic packaging.