4H-SiC is widely employed in power electronic devices operating under high frequencies, voltages, and temperatures due to its exceptional physical properties. However, its inherent high hardness and elastic modulus induce inevitable residual stress during device fabrication. Raman spectroscopy, which leverages lattice dynamics, offers an effective, non-destructive, rapid, and contactless method for measuring these stresses. Nevertheless, its accuracy critically depends on precisely determining the Raman phonon deformation potential constant. This work investigates mechanically induced Raman shifts in 4H-SiC via first-principles calculations and in-situ Raman spectroscopy under hydrostatic and non-hydrostatic stress conditions. The E2(TO) and A1(LO) phonon modes exhibit sensitivity to hydrostatic stress, whereas A1(LO) remains largely unaffected under shear, reflecting directional vibrational differences. Theoretical predictions and experimental measurements agree well within 16% error, highlighting the effectiveness of Raman-based stress detection for 4H-SiC. This integrated theoretical–experimental approach provides a robust framework for stress and strain analysis, facilitating the design and fabrication of next-generation 4H-SiC electronic devices.

With the miniaturization and high-power requirements of microelectronic devices, the current density carried by interconnects in packaging structures continually increases and reaches the threshold of electromigration (EM) failure. In this study, we investigated the microstructure evolution and void formation in aluminum (Al) interconnects during EM at three different current densities (1/3/5 MA/cm ²) and proposed a method coupling the fully coupled theory with an optimized atomic flux divergence method. The results show as follows. First, for the interconnects in integrated circuits, current density is the main factor affecting the EM lifetime of the interconnects in a certain temperature range. With the gradual increase of current density, the contribution of thermal transfer on EM cannot be ignored. The atomic concentration gradient and stress gradient can inhibit EM failure. Second, the increase of length and the decrease of width of interconnect will lead to the increase of atomic flux inside the structure, resulting in the accumulation of voids and atoms. Third, the structure is dynamically reconstructed after deleting the atoms below the failure threshold and the simulation results agree well with the experimental results. Compared with the traditional atomic flux divergence method, the improved atomic flux divergence method based on the fully coupled theory can better fit the change trend of atomic concentration after interconnect failure, and the failure time error is reduced by about 10%.

Sintered Cu nanoparticles (NPs) are promising for high-performance electronics due to their excellent thermal and electrical conductivity, as well as mechanical reliability. This study investigates the microscale mechanical behavior of sintered Cu NPs with a bimodal particle size distribution, focusing on strain rate and temperature effects. Micro-pillar compression tests were performed across strain rates of 0.0001 s⁻¹ to 0.01 s⁻¹ and temperatures from 25 °C to 350 °C. Results show that higher strain rates enhance yield strength through strain-rate hardening, while elevated temperatures lead to thermal softening and reduced mechanical stability. The Anand viscoplastic model accurately predicts these deformation behaviors. Microstructural analysis via scanning electron microscopy (SEM) and transmission electron microscopy (TEM) reveals localized deformation at 175 °C, with dislocations concentrated near the top surface and persistent porosity below, whereas at 350 °C, re-sintering and grain boundary diffusion create a denser microstructure. Phase-field fracture modeling further elucidates crack propagation, emphasizing the role of pore size and temperature. This combined experimental and modeling approach enhances understanding of viscoplastic deformation and fracture mechanisms in sintered Cu NPs, informing their use in interconnects, power electronics and thermal management systems.

This study investigates the microstructure evolution and mechanical behavior of bimodal-sized sintered copper (Cu) nanoparticles (NPs) under varying sintering pressures. Micro-pillar compression tests reveal a transition from collapse-dominated to compaction-driven deformation as sintering pressure increases. Transmission electron microscopy (TEM) and transmission Kikuchi diffraction (TKD) analyses identify a two-stage deformation mechanism—initial pore compaction followed by intragranular slip—fundamentally distinct from bulk Cu. Molecular dynamics (MD) simulations further reveal that large particles promote dislocation-mediated plasticity by accommodating intragranular slip, while small particles enhance load transfer through localized shear-compaction, together enabling uniform strain distribution and supporting the experimentally observed strain accommodation. The resulting microstructure achieves a combination of high yield strength (up to 320 MPa) and low elastic modulus (20 GPa), offering a compliant yet robust response. These findings elucidate a unique processing–structure–property relationship and provide a rational basis for designing porous metal interconnects capable of withstanding thermomechanical stresses in advanced electronic packaging.

Accurate characterization and calculation of the interfacial stresses are of key importance for the optimization of the chip sintering process and the evaluation of the long-term reliability of the chip interconnect. In this study, the pioneering application of confocal Raman spectroscopy for the accurate, rapid, and nondestructive characterization of interfacial stresses at the interconnections of silicon carbide chips was undertaken. Silicon carbide chips (5 mm ∗ 5 mm) were mounted to active metal brazing substrates by pressure-assisted sintering using copper nanoparticles. Subsequently, finite element simulations were used to model the thermally induced deformation and stress in the SiC chip. The thermally induced warpage of the SiC chip was then measured using interferometry. Finally, confocal Raman spectroscopy was employed to measure the interface stress distribution at the SiC sintered copper interface. The results showed that finite element simulations could not accurately assess the thermally induced deformation and stress in the SiC chip. The proposed method based on confocal Raman spectroscopy for testing chip interconnection interface stresses achieved an excellent balance between accuracy, non-contact measurement, and non-destructive testing. The residual stress at the backside interface of the SiC chip was concentrated in the central region of the chip, with compressive stress values ranging from -139 MPa to -165 MPa. Theoretically, this study provides a new framework for modeling and researching the reliability of electronic packaging interfaces.

This study investigates the interface strength and fracture behavior of sintered copper (Cu) nanoparticles (NPs) for all-Cu integration in advanced microelectronics packaging. Micro-cantilever bending tests on three configurations (Cu NP-notched, interface-notched and un-notched micro-cantilevers) were analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) and cohesive zone model (CZM). The interface-notched micro-cantilevers demonstrate superior fracture resistance, with a stress intensity factor (K_Q) of 2.88±0.10 MPa m^1/2, compared to 2.12±0.11 MPa m^1/2 for Cu NP-notched micro-cantilevers. Simulation results, consistent with experimental results, reveal that Cu NP-notched micro-cantilevers exhibit lower fracture resistance due to porosity and stress concentrations, while interface-notched micro-cantilevers show enhanced strength, attributed to robust bonding and reduced void distribution. Un-notched micro-cantilevers display superior load-bearing capacity, with cracks bypassing the interface and propagating through porous regions. Moreover, in un-notched micro-cantilevers, a synergistic deformation mechanism is observed, where crack propagation through the sintered Cu NPs coexists with plastic slip deformation in the Cu substrate. These findings highlight the strong interfacial bonding and effective stress transfer at the Cu substrate-sintered Cu NP interface, validating the feasibility of direct sintering using Cu NPs without additional coatings.

The power semiconductor joining technology through sintering of copper nanoparticles is well-suited for die attachment in wide bandgap (WBG) semiconductors, offering high electrical, thermal, and mechanical performances. However, sintered nanocopper will be prone to degradation resulting from corrosion in sulfur-containing corrosive environments such as offshore areas. In this study, experiments, including aging test and corrosion characterization, and simulations based on density functional theory (DFT) studies were conducted to explore the corrosion behavior and mechanism of elemental sulfur (S₈) and hydrogen sulfide (H₂S) on sintered nanocopper. The experimental results indicated that loose corrosion products were observed on the sintered nanocopper during the ageing process involving S₈, and compact layered corrosion products formed during the ageing process involving H₂S. Furthermore, similar corrosion product compositions (Cu₂O, Cu₂S, CuO, CuS, and potentially Cu₂SO₄ or CuSO₄) were observed in both the S₈- and H₂S-ageing processes. However, the S₈-ageing process exhibited more noticeable corrosion penetration. This was explained in simulations results: the unsaturated Cu sites on the oxide layer [Cu₂O(1 1 1)] of the sintered nanocopper could adsorb both H₂S and S₈, while the saturated Cu sites only exhibited the potential to adsorb S₈.

MAlSiN₃:Eu²⁺ (M = Ca, Sr) is commonly used in high-power phosphor-converted white-light-emitting diodes and laser diodes to promote their color-rendering index. However, the wide application of this phosphor is limited by the degradation of its luminescent properties in high-temperature, high-humidity, and high-sulfur-content environment. Here, the degradation mechanism of the (Sr,Ca)AlSiN₃:Eu²⁺ (SCASN) red phosphor under thermal-moisture-sulfur coupling conditions is investigated. Furthermore, by performing first-principles calculations, the hydrolysis mechanism on an atomic scale is assessed. The adsorption energy (E_ads) and charge transfer (ΔQ) results showed that H₂O chemically adsorbed on the (0 1 0), (3 1 0), and (0 0 1) surfaces of the CaAlSiN₃ (CASN) host lattice. The energy barrier for H₂O dissociation is only 29.73 kJ mol⁻¹ on the CASN (0 1 0) surface, indicating a high dissociation probability. The formation of NH₃, Ca(OH)₂, and CaAl₂Si₂O₈ is confirmed by H⁺ tended to combine with surface N atoms, while OH⁻ combined with the surface Al/Si or Ca atoms. Moreover, ab initio molecular dynamics simulations were performed to further understand the hydrolysis process. This work offers a guidance on the design and applications of luminescent materials in LED packages with higher reliability and stability requirements in harsh environment.

This paper presented a comprehensive experimental and simulation study for thermomigration (TM) accompanying electromigration (EM) at elevated current densities. Both Blech and standard wafer-level electromigration acceleration test (SWEAT)-like test structures, with aluminum (Al) as a carrier, were used for testing and analysis. In Part I of our study (Cui et al., 2023a), the experimental and numerical results with the current density of 1 MA/cm² were presented. We observed that Al stripes with a SWEAT structure did not show damage in the entire length, while Blech structures showed void and hillock formations only at the cathode and anode, respectively. The temperature gradient owing to Joule heating was neglected in our previous simulations, and the predicted results agreed well with the experimental observations. However, we have not theoretically verified the effect of the temperature gradient. In this paper, we first reported the new experimental data under the elevated current densities of 3 and 5 MA/cm². In both Blech and SWEAT structures, the spreading of voids in the middle region of conductors was observed. Moreover, in Blech structures, voiding in the middle region occurred after a period of time when voids/hillocks were formed at the cathode and anode, while the SWEAT structures did not show damage at the two ends. Next, based on the coupled 3D theory (Cui et al., 2023a), new analytical one-dimensional (1D) solutions were derived for the Blech and SWEAT structures in the un-passivated configuration considering TM. We found that TM played a significant role in the EM development in the middle of conductors under the elevated current density. The numerical results were in excellent agreement with the experimental data with the consideration of TM. We further established new EM failure's threshold criteria for the SWEAT structures in the form of the product of current density and square of conductor length. This is a major departure from the original Blech's theory in which only mechanical stress gradient was considered. We also studied the acceleration factor of the current density exponent and presented an insight into failure mechanisms associated with TM.

This paper presented integrated electromigration (EM) studies through experiment, theory, and simulation. First, extensive EM tests were performed using Blech and standard wafer-level electromigration acceleration test (SWEAT)-like structures, which were fabricated on four-inch wafers. Second, a molecular dynamics (MD) simulation-based diffusion-induced strain was incorporated into the existing coupled theory. Third, one-dimensional (1D) governing equations in terms of atomic concentration for un-passivated and passivated configurations were derived for void formation and growth, using a modified Eshelby's solution to consider the effect of passivation. Fourth, a systematic approach was established, including theoretical formulations and experimental methods, to obtain key material properties, i.e., critical atomic concentration and diffusivity. We then determined the material's properties from a specific set of experimental data, using aluminium (Al) as a carrier for demonstration. These properties were then used to predict the time to failure and void growth under various conditions. The theoretical results agreed well with the experimental data. Moreover, we theoretically determined the critical threshold products of current density and conductor length for the un-passivated and passivated configurations, respectively. Both experiment and theory showed that, in the absence of mechanical stress in un-passivated configurations, the atomic self-diffusion, which was opposite to electron wind, was significant in resisting EM development. However, when mechanical stress was present, such as in passivated configurations, stress migration played a dominant role in resisting EM development. Our numerical results showed that the current density exponent n in Black's law remained as 2 in the range of the current density greater than 0.2 MA/cm² and rapidly approached infinity at a low level of current density.

As the next generation of semiconductor devices, SiC MOSFETs have demonstrated significant performance improvements in switching loss, switching frequency, and high-temperature operation compared to Si-based MOSFETs. However, the long-term reliability of such devices and their packaging continues to be a major concern. Towards addressing this challenge, this study proposes a multi-objective optimization design method for parasitic inductance (L), thermal strain (?), and thermal resistance (R) of SiC MOSFETs with Fan-Out Panel-Level Packaging (FOPLP). First, the orthogonal experimental design was employed to investigate the thickness effects of baseplate, solder, die and redistribution layer (RDL) on L, e, and R. Then, the multi-objective optimization was developed to simultaneously reduce L, G, and R. Finally the fatigue lifetimes of the optimized and initial SiC MOSFET FOPLP structures were compared to verify the optimization's accuracy. Study findings include: (1) Solder thickness was the most significant influence factor for L, e and R of SiC MOSFET FOPLP, L and R increased, and e decreased with increasing solder thickness; (2) The proposed multi-objective optimization method coupled with a genetic algorithm achieved 14.79, 8.96, and 9.28% reduction of L, e, and R, respectively; (3) The fatigue lifetime of solder (SAC305) was evaluated using the Coffin-Manson model, with predicted lifetimes before and after optimization being 6786 and 7085 cycles, respectively, demonstrating that the proposed approach significantly enhanced the designed SiC MOSFET FOPLP's long-term thermal cycling reliability.

Considerable advancements in power semiconductor devices have resulted in such devices being increasingly adopted in applications of energy generation, conversion, and transmission. Hence, we proposed a fan-out panel-level packaging (FOPLP) design for 30-V Si-based metal-oxide-semiconductor field-effect transistor (MOSFET). To achieve superior reliability of packaging, we applied the nondominated sorting genetic algorithm with elitist strategy (NSGA-II) and ant colony optimization-backpropagation neural network (ACO-BPNN) to optimize the design of redistribution layer (RDL) in FOPLP. We first quantified the thermal resistance and thermomechanical coupling stress of the designed package under thermal cycling loading. Next, NSGA-II and ACO-BPNN were used to optimize the size of the RDL blind via. Finally, the effectiveness of the proposed reliability optimization methods was verified by performing thermal shock reliability aging tests on the prepared devices.

As a promising technology for high-power and high-temperature power electronics packaging, nanocopper (nanoCu) paste sintering has recently received increasing attention as a die-attachment. The high-temperature deformation of sintered nanoCu paste and its underlying mechanisms challenge the reliability of high-power electronics packaging. In this study, the tensile deformation behaviors of sintered nanoCu paste were firstly characterized by high-temperature tensile tests performed at various temperatures and strain rates ranging from 180 °C to 360 °C, 1 × 10⁻⁴ s⁻¹ to 1 × 10⁻³ s⁻¹ respectively. It was found that the elastic modulus and tensile strength decreased at the higher tensile temperature while the ductility increased accordingly. The highest elastic modulus and tensile strength results were 12.15 GPa and 46.97 MPa, respectively. Second, failure analysis was conducted based on the fracture surface after tensile testing. Recrystallization was revealed as the main factor for ductility improvement. Subsequently, an Anand model was fitted by stress-strain curves to describe the tensile constitutive behavior of the sintered nanoCu paste. Multi-scale modelling techniques also investigated the impact of tensile temperature and strain rate on the tensile response. Molecular dynamics simulation was implemented using a hemispherical Cu nanoparticle model to reveal the properties from an atomistic perspective. In addition, a two-dimensional equivalent model was further established by using a stochastically distributed void morphology. The multi-scale modelling techniques successfully describe the evolution of tensile response to the different tensile temperatures and strain rates. Besides, the equivalent model with random void morphology was demonstrated as the finite element simulation results were highly consistent with the high-temperature tensile experiments.

In this paper, we apply the Eshelby's solution to study the effect of passivation layer on electromigration (EM) failure in a conductor. The passivation layer is considered as an elastic material, not a rigid layer anymore. Thus, the deformation and stress evolution in the conductor during EM are related to the mechanical property of the passivation layer. One-dimensional (1D) analytical solution for the passivated conductor is obtained. The numerical results show that the conductor covered with the stiffer passivation layer has much less EM damage. And the steady-state solution shows that the magnitude of (jL)c increases with increasing Young's modulus of passivation material. The present study provides a way to predict the EM performances taking into account various passivation materials.

In this paper, stability and mechanistic simulations for a four-beam-mass-based MEMS gravimeter were conducted, and guidelines for the gravimeter design were proposed. Based on a prototyped MEMS device, the nonlinear finite element model was validated first against the experimental results. Then, we demonstrated three different scenarios in design that have three distinct modes of deformation: the mode with buckling (case 1), the mode without buckling but with a single zero-stiffness point (case 2), and the mode without both buckling and zero-stiffness point (case 3). Both case 1 and case 2 presented an unstable and sensitive region, in which a tiny perturbation could result in a rapid increase of the resonance frequency. Case 3, on the other hand, could provide a stable and low resonance frequency with a linear relationship between the displacement and gravitational acceleration. An optimized design of a beam/spring-mass-based relative gravimeter could be achieved using the above guidelines.

In this paper, we presented several practical aspects for building robust and reliable finite element models in thermomechanical modeling in electronics packaging using finite element analysis. Firstly, for layered or patterned structures, a homogenized equivalent model, with equivalent orthotropic material properties, gives excellent agreement with the exact finite element model solutions. Such a simplified finite element model provides an efficient way for structural parameter optimization. Secondly, the finite element mesh should keep the fixed size and shape at the location of interest where the singular point exists. This approach provides a simple way for relative stress comparison in different designs, although the absolute value of stress components has no actual meaning. Thirdly, to further eliminate the mesh dependency, the volume averaging method can be used. We extended the local volume averaging method for large-area die attach problems. Fourthly, in this paper, we presented a comparison study between linear elastic and nonlinear viscoplastic analysis, and demonstrated that in some cases, two different types of analysis give opposite trend results. Lastly, we demonstrated that with the use of different stress components, the conclusions may be different. We also provided an ANSYS APDL script in the supplemental material as a benchmark example.

Understanding the atomic diffusion features in metallic material is significant to explain the diffusion-controlled physical processes. In this paper, using electromigration experiments and molecular dynamic (MD) simulations, we investigate the effects of grain size and temperature on the self-diffusion of polycrystalline aluminium (Al). The mass transport due to electromigration are accelerated by increasing temperature and decreasing grain size. Magnitudes of effective diffusivity (Deff) and grain boundary diffusivity (DGBs) are experimentally determined, in which theDeffchanges as a function of grain size and temperature, butDGBsis independent of the grain size, only affected by the temperature. Moreover, MD simulations of atomic diffusion in polycrystalline Al demonstrate those observations from experiments. Based on MD results, the Arrhenius equation ofDGBsand empirical formula of the thickness of grain boundaries at various temperatures are obtained. In total,DeffandDGBsobtained in the present study agree with literature results, and a comprehensive result of diffusivities related to the grain size is presented.

In this paper, tin oxidation (SnO x )/tin-sulfide (SnS) heterostructures are synthesized by the post-oxidation of liquid-phase exfoliated SnS nanosheets in air. We comparatively analyzed the NO2 gas response of samples with different oxidation levels to study the gas sensing mechanisms. The results show that the samples oxidized at 325 °C are the most sensitive to NO2 gas molecules, followed by the samples oxidated at 350 °C, 400 °C and 450 °C. The repeatabilities of 350 °C samples are better than that of 325 °C, and there is almost no shift in the baseline. Thus this work systematically analyzed the gas sensing performance of SnO x/SnS-based sensor oxidized at 350 °C. It exhibits a high response of 171% towards 1 ppb NO2, a wide detecting range (from 1 ppb to 1 ppm), and an ultra-low theoretical detection limit of 5 ppt, and excellent repeatability at room temperature. The sensor also shows superior gas selectivity to NO2 in comparison to several other gas molecules, such as NO, H2, SO2, CO, NH3, and H2O. After X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, transmission electron microscope, and electron paramagnetic resonance characterizations combining first principle analysis, it is found that the outstanding NO2 sensing behavior may be attributed to three factors: The Schottky contact between electrodes and SnO x/SnS; active charge transfer in the surface and the interface layer of SnO x/SnS heterostructures; and numerous oxygen vacancies generated during the post-oxidation process, which provides more adsorption sites and superior bandgap modulation. Such a heterostructure-based room-temperature sensor can be fabricated in miniaturized size with low cost, making it possible for large-scale applications.