This study is motivated by a conceptual inconsistency in the physical interpretation of eight-chain hyperelastic theory, which arises from the combined effect of two distinct issues: the use of the marginal projection distribution p_z(|r_z|) as a surrogate for the full probability density of end-to-end distance p_r̄(r̄), and the subsequent reliance on a root mean square (RMS) approximation step in the micro–macro averaging of chain stretch. We first revisit this probabilistic mismatch by reformulating the probability density function of freely-jointed chains (FJCs) in terms of the squared end-to-end vector r², thereby restoring consistency on chain-level statistics. Building on this formulation, the micro–macro mapping averaging of chain conformational free energy is constructed directly in terms of r², leading to a one-step mean-field approximation that avoids RMS averaging. The modified probability transformation is examined by Monte Carlo sampling at the microscopic level. To account for interchain interactions, q-mean statistical description of micro tube confinement was incorporated, leading to the appearance of the general invariant I_q=λ₁^q+λ₂^q+λ₃^q. The resulting continuum constitutive model is assessed against multiaxial experimental data for several polymer networks, including vulcanized natural rubber, Entec Enflex S4035A thermoplastic elastomer, Tetra-PEG, and isoprene rubber vulcanizate. Comparisons with three existing hyperelastic strain energy formulations, the extended eight-chain, extended tube models, and the four-parameter ”comprehensive” model, demonstrate comparable phenomenological accuracy of the current model while providing a clearer and more consistent micro–macro physical interpretation of model parameters. A parametric study further illustrates how the dimensionless parameters n and q govern the shape of the macroscopic stress–strain responses. The present formulation provides a consistent theoretical basis within the scope of hyperelasticity and admits potential extensions toward more complex irreversible phenomena.

Residual stress and thermally induced warpage are critical reliability concerns in power electronic packaging, particularly when employing sintered copper nanoparticle (Cu NP) interconnects. While these interconnects provide high thermal and electrical performance, they also introduce significant interfacial stresses during bonding that alter mechanical behavior during service. This study develops an integrated confocal Raman–analytical modeling framework to directly quantify and mechanistically interpret these stresses in a representative SiC/Sintered Cu NPs/Active Metal Brazing ceramic substrate (AMB) stack. Raman spectroscopy reveals a compressive interfacial stress field peaking at −334 MPa near the chip center with localized hotspots linked to microporosity. Complementary in-situ Moiré interferometry tracked warpage evolution during thermal cycle (30–310°C). Coupling this stress measurement with a three-dimensional thermoelastic model, and explicitly assigning the bonding temperature as the stress-free reference, enables accurate reproduction of the temperature-dependent warpage trajectory. The model predictions align with experimental interferometry within < 5% deviation. These results demonstrate that incorporating residual stress is essential to realistically capture thermo-mechanical evolution. The proposed Raman–model paradigm advances beyond prior purely numerical or purely experimental efforts by bridging quantitative stress mapping with predictive warpage modeling. This methodology provides essential insights for thermal-induced residual stress and warpage managements in high-temperature power electronics packaging, providing a stress-informed foundation for reliability assessment and design optimization.

Ion implantation and subsequent annealing reshape the defect landscape and stress state of compound semiconductors, yet the temperature-dependent mechanisms in SiC remain incompletely understood. Here, we utilize molecular dynamics (MD) simulations and confocal micro-Raman measurements to resolve how implantation temperature and post-annealing regulate lattice disorder, amorphization kinetics, and residual-stress evolution in chemical vapor deposited (CVD) 4H-SiC. MD reveals surface-nucleated amorphization that propagates inward, whereas elevated implantation temperatures activate defect recombination pathways that suppress amorphous-layer formation. Raman signatures of optical-phonon shifts, linewidth broadening, and amorphization bands track the coupled evolution of lattice disorder and stress. Experimentally, increasing implantation temperature smooths the surface (S_a 0.133 → 0.101 nm) and reduces the amorphous-layer thickness (from ∼700 nm at 25°C to undetectable at 500°C), while driving more compressive residual stress (−57 → −132 MPa). Post-annealing largely restores phonon lifetimes and eliminates amorphization signatures, consistent with the recovery trends predicted by MD. These results delineate a thermal-treatment window that controls amorphization and residual stress in 4H-SiC, providing a transferable Raman-based methodology for nondestructive assessment of implantation-induced damage in compound semiconductors.

Pressureless sintered Ag pastes are promising die-attach materials for power electronics, yet practical sintering-profile optimization still relies heavily on trial-and-error, and the link from thermal kinetics to fracture-relevant microstructure and strength remains insufficiently established. In this work, a thermal-kinetics-guided workflow was developed to design paste-specific pressureless sintering profiles for two commercial Ag pastes (a spherical-particle paste and a flake-based paste) and to interpret the resulting strength–fracture response using SEM-based, heterogeneity-aware learning. Multi-heating-rate TGA was used to define the conversion fraction (α), while DSC was used to identify the dominant thermal-event window and extract the characteristic peak temperature for Arrhenius pairing. The TGA-defined conversion evolution was then modeled using a JMAK/Avrami form with Arrhenius temperature dependence to predict the isothermal holding time required to reach a target conversion at a selected dwell temperature. Relative to supplier-recommended profiles, the optimized profiles increased die-shear strength by 35% for the spherical-particle paste and by 206% for the flake-based paste, and promoted a fracture-mode transition from interfacial debonding toward mixed/cohesive fracture. Pearson/Ridge baselines and attention-based multiple-instance learning (MIL) linked strength and fracture-mode distribution to porosity/connectivity-related descriptors; paste-wise normalization mitigated paste-specific baselines and enabled MIL to reveal profile-induced microstructure–performance co-variation. Overall, this study establishes a practical workflow that couples thermal-kinetics-guided profile design with mechanical and fractographic validation and interpretable microstructure–property attribution, supporting mechanism-informed optimization of pressureless sintered Ag die-attach pastes.

This paper investigates the surge reliability of commercial 1200V SiC MOSFETs through a combined approach of experimental testing and multiphysics simulation, elucidating the failure mechanisms under both step and repetitive surge current stress. The innovative integration of package-level electro-thermal coupling simulation with transient junction temperature estimation overcomes the limitations of conventional methodologies that rely solely on decapsulation analysis and Technology Computer Aided Design (TCAD) simulation. Experimental evaluations on six Devices Under Test (DUTs) with distinct structural configurations, employing surge testing and failure analysis techniques including C-mode Scanning Acoustic Microscopy (C-SAM), optical microscopy, and Scanning Electron Microscope (SEM), confirm that device failure primarily originates from gate-source short circuits caused by aluminum bonding wire melting. COMSOL multiphysics simulations further replicate the transient thermal characteristics of bonding wire regions, demonstrating rapid temperature escalation to the Aluminum melting point within 5-6 ms during surge events. A transient thermal resistance-based junction temperature characterization method is proposed, revealing an inverse proportionality between thermal resistance and chip area.

Two-dimensional materials (2DMs)-based devices exhibit aerospace potential due to their superior properties. However, the operational reliability of 2DMs-based devices in space environments is significantly influenced by charged-particle radiation, necessitating rigorous ground-based radiation tolerance assessments. Current research on radiation effects in 2DMs is primarily experimental, yet such methodologies are inherently time-consuming, resource-intensive, and limited in throughput. To address these challenges, computational modeling and simulation techniques are increasingly being integrated with experimental characterization to accelerate materials design and unravel underlying physical mechanisms. This review systematically evaluates the state-of-the-art multiscale computational frameworks for 2DMs research, focusing on recent advancements, technical challenges, and emerging opportunities. A novel integrative approach is proposed, combining density functional theory, molecular dynamics, Monte Carlo, finite element analysis, and machine learning techniques. Particular emphasis is placed on addressing challenges in multiscale modeling, including accurate representation of complex phenomena across spatial and temporal scales under extreme environmental conditions. Conversely, opportunities for enhancing predictive capabilities are highlighted, with implications for expediting materials discovery in electronics, photonics, energy storage, catalysis, and nanomechanical systems. This comprehensive survey provides a strategic roadmap for future research directions in multiscale computational modeling of 2DMs, emphasizing interdisciplinary methodologies that bridge atomistic simulations with macroscale engineering applications. The insights presented herein aim to advance the development of radiation-hardened 2DMs-based devices for next-generation aerospace systems.

Reliable 4H-SiC for high-power electronics and quantum photonics requires a quantitative understanding of how contact loading drives microstructure evolution and load-bearing/fracture response in epitaxial layers. Here, we integrate instrumented indentation, confocal micro-Raman residual-stress metrology, atomistic molecular dynamics (MD), and high-resolution TEM (HRTEM) to establish processing–microstructure–mechanical property linkages in chemical vapor deposition (CVD) 4H-SiC epilayers. At peak depths of 600–1050 nm, indentation promotes Palmqvist-type radial cracks and the apparent indentation toughness K_IC increases from 0.87 ± 0.08 to 1.20 ± 0.05 MPa m^1/2 with depth, consistent with plastic-zone growth and dislocation shielding. E₂(TO) Raman mapping quantifies an increase in residual stress from ∼302 ± 60 to ∼665 ± 72 MPa. It also shows that the incremental broadening of the FWHM becomes less pronounced beyond ∼750 nm, suggesting that the near-surface disorder indicator within the Raman probe volume approaches a quasi-steady level. MD captures a 4H → 3C phase transformation, amorphization beneath indenter ridges, and dislocation nucleation/growth, which HRTEM directly corroborates. The combined measurement–model–validation closed loop yields a depth-dependent relationship between residual-stress accumulation and apparent toughness, converting them into an actionable processing window: constraining penetration depth below ∼0.75 μm limits residual stress and near-surface disorder. These results provide physics-based guidance for machining and packaging of 4H-SiC epilayers and illustrate a transferable framework for brittle, anisotropic ceramics.

Sintered Cu nanoparticles (Cu NPs) are promising interconnection materials for high-temperature power electronics, yet how their authentic three-dimensional pore architecture governs microscale deformation remains unclear. Here, synchrotron nano-computed tomography (nano-CT) was combined with in-situ micropillar compression, explicit dynamic elastoplastic finite element analysis, and TEM/TKD characterization to interrogate sintered Cu NPs. The nano-CT voxel size was 45 nm, and the reconstructed volume corresponded to a cylinder 16 µm in diameter and 10 µm in height. The average sectional porosity was 12.44%, with a systematic discrepancy between two-dimensional and three-dimensional porosity quantification. During loading, the porosity decreased to 9.55% while the pore aspect ratio increased from 1.82–2.35. Finite element analysis further showed pronounced pore-adjacent stress/strain localization at the elastic–plastic transition, with local stress and equivalent plastic strain reaching 650 MPa and 1.7 × 10⁻², compared with 250 MPa and 1.1 × 10⁻³ in adjacent regions. The GND density increased by 95.9% at a compressive strain of 26%, linking pore-induced strain gradients to dislocation accumulation. These results quantitatively connect authentic three-dimensional pore architecture, local deformation localization, and dislocation-mediated strengthening in sintered Cu NPs. Highlights Synchrotron nano-CT (45 nm voxel size) reconstructed a 16 × 10 µm cylindrical volume of sintered Cu NPs and resolved the authentic 3D pore network. Sectional porosity was 12.44%, and 2D/3D quantification showed a systematic discrepancy, with porosity decreasing to 9.55% and pore aspect ratio increasing from 1.82 to 2.35 during compression. Pore-adjacent localization was quantified at the elastic–plastic transition, with local stress/PEEQ reaching 650 MPa and 1.7 × 10⁻² versus 250 MPa and 1.1 × 10⁻³ in adjacent regions. A 95.9% increase in GND density at 26% compressive strain links pore-induced strain gradients to dislocation accumulation and strain-gradient-driven strengthening.

The reliability of through-glass via (TGV) interconnects is critical for advanced semiconductor packaging. This work investigates microstructural and mechanical evolution in electroplated TGV–Cu subjected to long-term aging at 250 °C. TGV samples were fabricated via laser-induced etching and double-sided copper electroplating, then aged for up to 1008 h. Nanoindentation revealed region-dependent reductions in hardness (from 2.0–2.5 GPa to below 0.5 GPa) and modulus (from 110–130 GPa to 40–90 GPa), with surface-near regions most affected. The glass substrate maintained stable mechanical properties until microcracks formed after 1008 h. EBSD quantification showed grain-size enlargement from 0.46 µm to 1.86 µm and a concurrent decrease in dislocation density. Molecular dynamics simulations of 3, 4, 5 nm grains corroborated the inverse relationship between grain size and micro-mechanical properties. A hybrid Potts-phase field model further linked grain coarsening to stress relaxation and elastic-energy minimization, revealing that as grains grow, the overall von Mises stress in the structure decreases; high-modulus grains retain relatively higher local stresses, while low-modulus, low-stress grains exhibit faster growth rates. Electrical I–V measurements confirmed stable ohmic behavior, despite a drop in insulation resistance. These integrated experimental and computational insights provide theoretical guidance for optimizing TGV interposer design and ensuring long-term operational reliability in heterogeneous integration technologies. (Figure presented.)

Although silver sintering is widely used in die attach, its reliability under low-pressure and pressureless sintering conditions remains a challenge, and the degradation mechanism needs to be addressed urgently. This study investigates the degradation mechanisms of silver sintered die attach subjected to thermal shock (TS) (−45 °C to 125 °C), revealing its microstructural evolution, degradation of mechanical properties, and pore dynamics. After 1500 cycles, the average porosity did not decrease and remained at approximately 10%, but the porosity distribution exhibited significant heterogeneity, forming three characteristic regions of high porosity, low porosity, and crack regions. With the porosity evolution, the grain size increased by a factor of 2.1–2.8, with the largest grain sizes in the crack region, and the recrystallization fraction decreased significantly, from 89.6 % to a range of 37.3 %–72.1 %. Additionally, the combination with the decrease in both statistically stored dislocation density and total dislocation density reveals a decline in hardness and yield strength of silver sintered layer from 1.05 GPa and 326 MPa to 0.92 GPa and 231 MPa, respectively, gradually diminishing their ability to impede pore migration and merging. Thermal-mechanical coupling simulations based on the actual porous structure images show that the mismatch in the coefficient of thermal expansion induces alternating tensile and compressive thermal stresses, driving pore evolution and crack propagation. The kinetic Monte Carlo (KMC) Potts model based on Kawasaki dynamics combined with pore conservation can effectively predict the long-term pore evolution in this case. These findings provide important guidance for optimizing the sintering process and improving the application of silver sintering materials in high-reliability electronic packaging.

The degradation mechanisms of silicon carbide (SiC) VDMOSFET and trench metal oxide semiconductor field effect transistor (MOSFET) in a 60Co gamma irradiation environment were investigated. The degradation of electrical characteristics of SiC MOSFET in different working states after irradiation with different total ionizing doses (TIDs) was explored. The defects induced during the irradiation process were studied in annealing experiments conducted after irradiation. The reasons for the degradation of SiC MOSFET caused by TID were revealed, and a prediction model of threshold voltage (Vth) shift was proposed and verified through TCAD simulation. The Vth, breakdown voltage (BV), on-resistance R, input capacitance (Ciss), output capacitance Coss, and reverse transfer capacitance C _rss were measured at different irradiation doses and annealing conditions. Experimental results indicated that the degradation of both Ron and Ciss was primarily caused by the Vth shift. As the doses increased, the shift in Vth gradually reached saturation. Similar trends to VDMOSFET were observed in trench MOSFET but with greater sensitivity to TID. In addition, MOSFETs biased at zero voltage exhibited lower shifts in Vth compared with those under high gate bias conditions. Furthermore, the increase in defects in the gate oxide during irradiation and annealing processes were calculated. Finally, a model predicting Vth shift path was established, and its accuracy and limitations were determined. This study provides valuable insights into the effect of TID on SiC MOSFETs.

With the miniaturization and high-power requirements of microelectronic devices, the current density carried by interconnects in packaging structures continually increases and reaches the threshold of electromigration (EM) failure. In this study, we investigated the microstructure evolution and void formation in aluminum (Al) interconnects during EM at three different current densities (1/3/5 MA/cm ²) and proposed a method coupling the fully coupled theory with an optimized atomic flux divergence method. The results show as follows. First, for the interconnects in integrated circuits, current density is the main factor affecting the EM lifetime of the interconnects in a certain temperature range. With the gradual increase of current density, the contribution of thermal transfer on EM cannot be ignored. The atomic concentration gradient and stress gradient can inhibit EM failure. Second, the increase of length and the decrease of width of interconnect will lead to the increase of atomic flux inside the structure, resulting in the accumulation of voids and atoms. Third, the structure is dynamically reconstructed after deleting the atoms below the failure threshold and the simulation results agree well with the experimental results. Compared with the traditional atomic flux divergence method, the improved atomic flux divergence method based on the fully coupled theory can better fit the change trend of atomic concentration after interconnect failure, and the failure time error is reduced by about 10%.

This study investigates the interface strength and fracture behavior of sintered copper (Cu) nanoparticles (NPs) for all-Cu integration in advanced microelectronics packaging. Micro-cantilever bending tests on three configurations (Cu NP-notched, interface-notched and un-notched micro-cantilevers) were analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) and cohesive zone model (CZM). The interface-notched micro-cantilevers demonstrate superior fracture resistance, with a stress intensity factor (K_Q) of 2.88±0.10 MPa m^1/2, compared to 2.12±0.11 MPa m^1/2 for Cu NP-notched micro-cantilevers. Simulation results, consistent with experimental results, reveal that Cu NP-notched micro-cantilevers exhibit lower fracture resistance due to porosity and stress concentrations, while interface-notched micro-cantilevers show enhanced strength, attributed to robust bonding and reduced void distribution. Un-notched micro-cantilevers display superior load-bearing capacity, with cracks bypassing the interface and propagating through porous regions. Moreover, in un-notched micro-cantilevers, a synergistic deformation mechanism is observed, where crack propagation through the sintered Cu NPs coexists with plastic slip deformation in the Cu substrate. These findings highlight the strong interfacial bonding and effective stress transfer at the Cu substrate-sintered Cu NP interface, validating the feasibility of direct sintering using Cu NPs without additional coatings.

Reducing parasitic parameters and thermal resistance is critical for advancing power electronic devices. This article designs and evaluates the three printed circuit board (PCB) embedded 1200 V SiC mosfet half-bridge packaging cells, where the traditional wire bonding process is replaced by a redistribution layer (RDL) technique. A comprehensive evaluation of their electrical performance, thermal management, and mechanical performance is conducted. The three solutions that employ panel, active metal brazing (AMB), and lead—frame carriers, are developed through a streamlined process that includes die attach, molding, drilling, plating, and etching. This packaging approach readily reduces the parasitic inductance to below 5 nH. By utilizing a single-layer RDL with mutual inductance cancellation, the power loop inductance is reduced to as low as 2.4 nH (at 10 MHz), and the gate loop inductance to 1.57 nH (at 10 MHz). The junction-to-case thermal resistances of the three solutions are 1.88, 1.03, and 0.73 K/W, respectively. Compared with the other two packaging cells, the cell selecting AMB as a carrier reduces SiC mosfet operational stress and deformation by approximately 34% and 75%. The lead—frame carrier offers superior thermal dissipation for potential TO package replacement in half-bridge topologies, while the panel solution is promising for dual-sided cooling applications. With low thermal resistance, minimal stress, and excellent backside electrical insulation, the packaging cell with an AMB carrier is ideally suited for integration with heatsinks in traction inverters.

This Letter presents a combined analytical and experimental method to effectively decouple the radial and tangential residual stress fields induced by Berkovich nanoindentation in single-crystalline 4H-SiC using micro-Raman spectroscopy. By integrating the Raman stress characterization model with Yoffe’s expanding cavity model, precise extraction of individual residual stress components around the indentation region is realized. Through the vertical backscattering micro-Raman mapping of the E2 phonon mode, we systematically investigate the residual stress distribution near the indentation. The results highlight significant anisotropy in nanoindentation-induced stress fields, strongly dependent on the crystal orientation of 4H-SiC, predominantly featuring radial tensile stress gradients. This comprehensive theoretical–experimental approach offers a robust optical framework for residual stress characterization in 4H-SiC and provides foundational insights for extending Raman spectroscopy-based stress characterization to other crystalline materials and related device structures.

This study investigates the microstructure evolution and mechanical behavior of bimodal-sized sintered copper (Cu) nanoparticles (NPs) under varying sintering pressures. Micro-pillar compression tests reveal a transition from collapse-dominated to compaction-driven deformation as sintering pressure increases. Transmission electron microscopy (TEM) and transmission Kikuchi diffraction (TKD) analyses identify a two-stage deformation mechanism—initial pore compaction followed by intragranular slip—fundamentally distinct from bulk Cu. Molecular dynamics (MD) simulations further reveal that large particles promote dislocation-mediated plasticity by accommodating intragranular slip, while small particles enhance load transfer through localized shear-compaction, together enabling uniform strain distribution and supporting the experimentally observed strain accommodation. The resulting microstructure achieves a combination of high yield strength (up to 320 MPa) and low elastic modulus (20 GPa), offering a compliant yet robust response. These findings elucidate a unique processing–structure–property relationship and provide a rational basis for designing porous metal interconnects capable of withstanding thermomechanical stresses in advanced electronic packaging.

The mechanical strength of sintered nanoparticles (NPs) limits their application in advanced electronics packaging. In this study, we explore the anisotropy in the microstructure and mechanical properties of sintered copper (Cu) NPs by combining experimental techniques with molecular dynamics (MD) simulations. We establish a clear relationship between processing conditions, microstructural evolution, and resulting properties in pressure-assisted sintering of Cu NPs. Our findings reveal that pressure-assisted sintering induces significant anisotropy in the microstructure, as evidenced by variations in areal relative density and the orientation distribution of necks formed during sintering. Specifically, along the direction of applied pressure, the microstructure exhibits reduced variation in areal relative density and a higher prevalence of necks with favorable orientations. The resulting anisotropic mechanical properties, with significantly higher strength along the pressure direction compared to other directions, are demonstrated through micro-cantilever bending tests and tensile simulations. This anisotropy is further explained by the combined effects of strain localization (influenced by areal relative density) and the failure modes of necks (determined by their orientation relative to the loading direction). This work provides valuable insights into the analysis of sintered NPs microstructures and offers guidance for optimizing the sintering process.

Optical micro-electromechanical systems (MEMS) demand exceptional precision, yet warpage during the die attach process on printed circuit boards can compromise performance. Here, a three-dimensional thermoelastic analytical model has been developed based on Fourier heat conduction and supported beam theory. This model facilitates the in-situ calibration of solder parameters via confocal micro-Raman spectroscopy, ensuring that the simulated dynamic evolution of warpage during soldering aligns closely with digital image correlation experiments. The results show consistence with Finite Element Method with error less than 1 % and time saving more than 60 %. Orthogonal experimental analysis further reveals that substrate thickness and thermal expansion coefficient variations are the primary factors affecting warpage, while chip area has a negligible role. Given the practical challenges in reducing substrate thickness, a stress-balancing strategy incorporating an additional transition layer is proposed, which is effectively validated with a high-resolution three-dimensional profilometer. This work provides valuable insights into the predictive modeling and warpage behavior characterization, directly supporting improved mitigation strategies in the die attach process.

Silicon carbide (SiC) power devices exhibit superior thermal conductivity and excellent high-temperature stability, making them promising for high-power applications under extreme environments. However, ensuring long-term reliability, especially for devices packaged with glass encapsulant, remains a significant challenge. This paper introduces a high-temperature step stress aging test as a highly accelerated life testing method to evaluate the reliability of SiC Schottky diodes packaged with glass encapsulants compared to traditional plastic-packaged counterparts. In this test, diodes undergo incremental thermal stress from 50 °C to 300 °C, increasing by 50 °C per step and held for 168 hours per step to simulate prolonged thermal exposure. Finite element simulations were also performed at 300 °C to analyze stress distributions in various packaging configurations. Post-aging results demonstrate the effectiveness of this accelerated method for rapidly assessing device degradation, providing valuable reliability insights for applications in extreme thermal environments such as aerospace power systems.

This study investigates the size-dependent mechanical behavior and deformation mechanisms of sintered copper (Cu) nanoparticles (NPs) through micro-pillar (2–6 μm diameter) compression tests, scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) analysis and molecular dynamics (MD) simulations. In-situ micro-pillar compression tests reveal a 25.9% reduction in yield strength (812 ± 64 MPa to 643 ± 47 MPa) with increasing pillar size, attributed to dislocation starvation in smaller pillars and porosity-driven strain localization in larger ones. TKD quantifies dynamic grain refinement (24.9% reduction in grain size) and geometrically necessary dislocation (GND) density escalation (74.8%), driven by stress gradients and grain boundary-mediated plasticity. Nanoindentation-derived elastic modulus (48.3 ± 11.1 GPa) exceeds micropillar values (29.5–33.9 GPa), reflecting substrate constraints in bulk testing. Microstructural analysis identifies a transition from shear banding in high-porosity pillars to uniform plasticity in denser systems, mediated by texture evolution (Brass/S components) and Schmid factor redistribution (62% increase in high-slip-activity grains). MD simulations of pressure-sintered Cu NPs elucidate atomic-scale mechanisms: dislocation nucleation at sintering necks, pore collapse-induced strain localization, and grain boundary sliding. These findings establish a multiscale framework linking porosity, grain refinement, and dislocation dynamics to mechanical performance, emphasizing microstructural optimization for enhanced reliability in microelectronic applications. The integration of MD simulations bridges atomic-scale mechanisms to microscale deformation, providing actionable insights for tailoring sintered Cu NPs via reduced porosity and controlled grain boundary architectures.