This Letter presents a combined analytical and experimental method to effectively decouple the radial and tangential residual stress fields induced by Berkovich nanoindentation in single-crystalline 4H-SiC using micro-Raman spectroscopy. By integrating the Raman stress characterization model with Yoffe’s expanding cavity model, precise extraction of individual residual stress components around the indentation region is realized. Through the vertical backscattering micro-Raman mapping of the E2 phonon mode, we systematically investigate the residual stress distribution near the indentation. The results highlight significant anisotropy in nanoindentation-induced stress fields, strongly dependent on the crystal orientation of 4H-SiC, predominantly featuring radial tensile stress gradients. This comprehensive theoretical–experimental approach offers a robust optical framework for residual stress characterization in 4H-SiC and provides foundational insights for extending Raman spectroscopy-based stress characterization to other crystalline materials and related device structures.

High-energy Al ion implantation is an indispensable technique for achieving precise doping in fabricating 4H‑SiC devices. However, it inevitably introduces interfacial damage and residual stress that can compromise subsequent manufacturing processes and device reliability. Conventional destructive characterization techniques cannot provide real-time, in‑situ, nondestructive monitoring under process conditions, creating a major bottleneck in quality control. Here, we establish a predictive modeling framework that integrates multiscale simulations with advanced, non‑destructive micro‑Raman spectroscopy to systematically investigate the evolution of high-energy Al ion implantation–induced interface defects and residual stress in 4H-SiC. Simulation results reveal a linear relationship between the implantation dose and the formation of vacancies and interstitial defects, while the stress accumulation tends to saturate at higher doses due to a dynamic equilibrium among defect interactions. Complementary micro‐Raman spectroscopy corroborates the simulations, showing that the damaged interface layer deepens from approximately 300 nm at a dose of 1014 ions cm−2 to nearly 500 nm at 1016 ions cm−2, consistent with Monte Carlo predictions. Furthermore, the molecular dynamics simulations capture a trend of the implantation stress evolution with strong concurrence with the Raman-measured residual stress. This combined computational–experimental approach elucidates the fundamental mechanisms governing defect formation and residual stress in ion‑implanted 4H‑SiC, establishes implantation dose as the pivotal role of 4H-SiC in defect density and residual stress, and underscores the utility of optical‑based characterization in real‑time, non‑invasive quality control for advanced manufacturing.

With the miniaturization and high-power requirements of microelectronic devices, the current density carried by interconnects in packaging structures continually increases and reaches the threshold of electromigration (EM) failure. In this study, we investigated the microstructure evolution and void formation in aluminum (Al) interconnects during EM at three different current densities (1/3/5 MA/cm ²) and proposed a method coupling the fully coupled theory with an optimized atomic flux divergence method. The results show as follows. First, for the interconnects in integrated circuits, current density is the main factor affecting the EM lifetime of the interconnects in a certain temperature range. With the gradual increase of current density, the contribution of thermal transfer on EM cannot be ignored. The atomic concentration gradient and stress gradient can inhibit EM failure. Second, the increase of length and the decrease of width of interconnect will lead to the increase of atomic flux inside the structure, resulting in the accumulation of voids and atoms. Third, the structure is dynamically reconstructed after deleting the atoms below the failure threshold and the simulation results agree well with the experimental results. Compared with the traditional atomic flux divergence method, the improved atomic flux divergence method based on the fully coupled theory can better fit the change trend of atomic concentration after interconnect failure, and the failure time error is reduced by about 10%.

This study investigates the size-dependent mechanical behavior and deformation mechanisms of sintered copper (Cu) nanoparticles (NPs) through micro-pillar (2–6 μm diameter) compression tests, scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) analysis and molecular dynamics (MD) simulations. In-situ micro-pillar compression tests reveal a 25.9% reduction in yield strength (812 ± 64 MPa to 643 ± 47 MPa) with increasing pillar size, attributed to dislocation starvation in smaller pillars and porosity-driven strain localization in larger ones. TKD quantifies dynamic grain refinement (24.9% reduction in grain size) and geometrically necessary dislocation (GND) density escalation (74.8%), driven by stress gradients and grain boundary-mediated plasticity. Nanoindentation-derived elastic modulus (48.3 ± 11.1 GPa) exceeds micropillar values (29.5–33.9 GPa), reflecting substrate constraints in bulk testing. Microstructural analysis identifies a transition from shear banding in high-porosity pillars to uniform plasticity in denser systems, mediated by texture evolution (Brass/S components) and Schmid factor redistribution (62% increase in high-slip-activity grains). MD simulations of pressure-sintered Cu NPs elucidate atomic-scale mechanisms: dislocation nucleation at sintering necks, pore collapse-induced strain localization, and grain boundary sliding. These findings establish a multiscale framework linking porosity, grain refinement, and dislocation dynamics to mechanical performance, emphasizing microstructural optimization for enhanced reliability in microelectronic applications. The integration of MD simulations bridges atomic-scale mechanisms to microscale deformation, providing actionable insights for tailoring sintered Cu NPs via reduced porosity and controlled grain boundary architectures.

The degradation mechanisms of silicon carbide (SiC) VDMOSFET and trench metal oxide semiconductor field effect transistor (MOSFET) in a 60Co gamma irradiation environment were investigated. The degradation of electrical characteristics of SiC MOSFET in different working states after irradiation with different total ionizing doses (TIDs) was explored. The defects induced during the irradiation process were studied in annealing experiments conducted after irradiation. The reasons for the degradation of SiC MOSFET caused by TID were revealed, and a prediction model of threshold voltage (Vth) shift was proposed and verified through TCAD simulation. The Vth, breakdown voltage (BV), on-resistance R, input capacitance (Ciss), output capacitance Coss, and reverse transfer capacitance C _rss were measured at different irradiation doses and annealing conditions. Experimental results indicated that the degradation of both Ron and Ciss was primarily caused by the Vth shift. As the doses increased, the shift in Vth gradually reached saturation. Similar trends to VDMOSFET were observed in trench MOSFET but with greater sensitivity to TID. In addition, MOSFETs biased at zero voltage exhibited lower shifts in Vth compared with those under high gate bias conditions. Furthermore, the increase in defects in the gate oxide during irradiation and annealing processes were calculated. Finally, a model predicting Vth shift path was established, and its accuracy and limitations were determined. This study provides valuable insights into the effect of TID on SiC MOSFETs.

The mechanical strength of sintered nanoparticles (NPs) limits their application in advanced electronics packaging. In this study, we explore the anisotropy in the microstructure and mechanical properties of sintered copper (Cu) NPs by combining experimental techniques with molecular dynamics (MD) simulations. We establish a clear relationship between processing conditions, microstructural evolution, and resulting properties in pressure-assisted sintering of Cu NPs. Our findings reveal that pressure-assisted sintering induces significant anisotropy in the microstructure, as evidenced by variations in areal relative density and the orientation distribution of necks formed during sintering. Specifically, along the direction of applied pressure, the microstructure exhibits reduced variation in areal relative density and a higher prevalence of necks with favorable orientations. The resulting anisotropic mechanical properties, with significantly higher strength along the pressure direction compared to other directions, are demonstrated through micro-cantilever bending tests and tensile simulations. This anisotropy is further explained by the combined effects of strain localization (influenced by areal relative density) and the failure modes of necks (determined by their orientation relative to the loading direction). This work provides valuable insights into the analysis of sintered NPs microstructures and offers guidance for optimizing the sintering process.

Optical micro-electromechanical systems (MEMS) demand exceptional precision, yet warpage during the die attach process on printed circuit boards can compromise performance. Here, a three-dimensional thermoelastic analytical model has been developed based on Fourier heat conduction and supported beam theory. This model facilitates the in-situ calibration of solder parameters via confocal micro-Raman spectroscopy, ensuring that the simulated dynamic evolution of warpage during soldering aligns closely with digital image correlation experiments. The results show consistence with Finite Element Method with error less than 1 % and time saving more than 60 %. Orthogonal experimental analysis further reveals that substrate thickness and thermal expansion coefficient variations are the primary factors affecting warpage, while chip area has a negligible role. Given the practical challenges in reducing substrate thickness, a stress-balancing strategy incorporating an additional transition layer is proposed, which is effectively validated with a high-resolution three-dimensional profilometer. This work provides valuable insights into the predictive modeling and warpage behavior characterization, directly supporting improved mitigation strategies in the die attach process.

Van der Waals heterojunctions (vdWHs) have garnered significant attention for their promising applications in optoelectronics, attributed to their exceptional physical attributes. In this study, we present a straightforward approach to fabricating high-performance vdWHs photodetectors. Specifically, we prepared WSO_x/WS₂ vdWH photodetectors through the ozone oxidation of a WS₂ thin films at 100 °C. To characterize the morphology and optical properties of both the WS₂ and WSO_x/WS₂ thin films, we utilized atomic force microscopy (AFM) and Raman spectroscopy. Additionally, X-ray photoelectron spectroscopy (XPS) was employed to delve into the structural evolution by scrutinizing the bonding states of W, O, and S in the WS₂ before and after the ozone oxidation process. The resultant WSO_x/WS₂ vdWH photodetectors exhibited impressive photoelectric performance at wavelengths of 475 nm and 532 nm. It demonstrated a high responsivity of 230.7 A/W, a remarkable specific detectivity of 1.794 × 10¹¹ Jones, and a swift response speed of 60 ms at 475 nm. Furthermore, first-principles calculations based on density functional theory (DFT) were conducted to validate the oxidation kinetics of monolayer WS₂, the type II energy band alignment, and the interlayer charge transfer within the WSO_x/WS₂ vdWH. This research contributes novel insights into the synthesis of two-dimensional transition metal oxides (TMOs)-transition metal dichalcogenides (TMDCs) heterostructures for photodetector applications.

This study investigates the interface strength and fracture behavior of sintered copper (Cu) nanoparticles (NPs) for all-Cu integration in advanced microelectronics packaging. Micro-cantilever bending tests on three configurations (Cu NP-notched, interface-notched and un-notched micro-cantilevers) were analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) and cohesive zone model (CZM). The interface-notched micro-cantilevers demonstrate superior fracture resistance, with a stress intensity factor (K_Q) of 2.88±0.10 MPa m^1/2, compared to 2.12±0.11 MPa m^1/2 for Cu NP-notched micro-cantilevers. Simulation results, consistent with experimental results, reveal that Cu NP-notched micro-cantilevers exhibit lower fracture resistance due to porosity and stress concentrations, while interface-notched micro-cantilevers show enhanced strength, attributed to robust bonding and reduced void distribution. Un-notched micro-cantilevers display superior load-bearing capacity, with cracks bypassing the interface and propagating through porous regions. Moreover, in un-notched micro-cantilevers, a synergistic deformation mechanism is observed, where crack propagation through the sintered Cu NPs coexists with plastic slip deformation in the Cu substrate. These findings highlight the strong interfacial bonding and effective stress transfer at the Cu substrate-sintered Cu NP interface, validating the feasibility of direct sintering using Cu NPs without additional coatings.

In harsh offshore environments, large-area sintered nano-copper (Cu) interconnections, which serve as die attachment material or thermal interface material (TIM), are prone to degradation from hydrogen sulfide (H2S) corrosion. This study introduced a film-forming technique based on atmospheric pressure plasma jet (APPJ) to improve the corrosion resistance of large-area sintered nanoCu joint. The corrosion protection mechanism against H2S-containing atmospheric corrosion was investigated using both experimental methods and density functional theory (DFT) simulations. The key findings were as follows: (1) The deposition film, primarily composed of a Si-O3 network, effectively protected sintered Cu plate from corrosion by H2S gas, and maintaining the mechanical performance of sintered Cu joint after 384 h of H2S testing. (2) The dissociation products of the APPJ-treated precursor hexamethyldisiloxane (HMDSO), −OSiCH3 and −OSi(CH3)3, formed stable chemical bonds on the sintered nanoCu surface, resulting in the formation of −OSiCH3(O-CH3)2 fragments. (3) The −OSiCH3(O-CH3)2 fragments were unreactive toward to corrosion agents such as H2S, O2, and H2O, and also serving as a barrier to block their access to the sintered nanoCu surface. This study provided a comprehensive understanding of the corrosion protection mechanism of sintered nanoCu using APPJ-deposited films, offering valuable insights for improving the reliability of power electronics.

With the rapid development of new energy vehicles and offshore wind power systems in coastal cities, the application scale of power devices is constantly increasing. However, the corrosion problem of power packaging interconnection materials caused by the humid air and chlorine-rich environment near the sea is gradually emerging. This study addresses the corrosion protection of sintered nano-copper by innovatively employing atmospheric pressure plasma jet (APPJ) technology with hexamethyldisiloxane (HMDSO) as precursor to construct organic-inorganic hybrid hydrophobic coatings on copper surfaces. Experimental results demonstrate that the coating exhibits a three-dimensional crosslinked Si-O network structure. The synergistic effect between surface micron-scale spherical clusters and methyl groups elevates the contact angle by 50 % to 153.1° Electrochemical characterization reveals that the coating positively shifts corrosion potential by 0.035 V and reduces corrosion current density from 6.008×10−7 A/cm2 to 5.542×10−7 A/cm2, while maintaining higher activation energy across the experimental temperature range (30–60℃). EIS tests show that the coating effectively increases the charge transfer impedance of the sample, indicating an improvement in corrosion resistance. The 168-hour immersion test confirms effective barrier against Cl−corrosive attack with preserved substrate integrity. Density functional theory (DFT) simulations elucidate that unsaturated methylated fragments in HMDSO preferentially graft onto copper surface via chemisorption, where strong interfacial bonding energies (-2.26 ∼ -4.38 eV) facilitate cleavage and crosslinking to form stable siloxane networks. This work proposes a novel anti-corrosion surface engineering strategy for copper interconnects, while revealing the plasma-induced interfacial bonding mechanisms of hybrid coatings, providing both theoretical and experimental foundations for developing durable electronic packaging materials.

Sintered Cu nanoparticles (NPs) are promising for high-performance electronics due to their excellent thermal and electrical conductivity, as well as mechanical reliability. This study investigates the microscale mechanical behavior of sintered Cu NPs with a bimodal particle size distribution, focusing on strain rate and temperature effects. Micro-pillar compression tests were performed across strain rates of 0.0001 s⁻¹ to 0.01 s⁻¹ and temperatures from 25 °C to 350 °C. Results show that higher strain rates enhance yield strength through strain-rate hardening, while elevated temperatures lead to thermal softening and reduced mechanical stability. The Anand viscoplastic model accurately predicts these deformation behaviors. Microstructural analysis via scanning electron microscopy (SEM) and transmission electron microscopy (TEM) reveals localized deformation at 175 °C, with dislocations concentrated near the top surface and persistent porosity below, whereas at 350 °C, re-sintering and grain boundary diffusion create a denser microstructure. Phase-field fracture modeling further elucidates crack propagation, emphasizing the role of pore size and temperature. This combined experimental and modeling approach enhances understanding of viscoplastic deformation and fracture mechanisms in sintered Cu NPs, informing their use in interconnects, power electronics and thermal management systems.

This work addresses a novel technique for selecting the best process parameters for the 4H–SiC epitaxial layer in a horizontal hot-wall chemical vapor reactor using a transient multi-physical (thermal-fluid-chemical) simulation model and combined with a machine-learning model. An experiment was performed to validate the feasibility of the numerical model. Secondly, a single-factor analysis was conducted to investigate the effects of process parameters, including the deposition temperature, inlet-flow volume, rotational speed of the susceptor, and cavity pressure, on the quality of the 4H–SiC epitaxial layer. Finally, a machine learning algorithm, the ant colony optimization-back propagation neural network (ACO–BPNN), was employed to develop the input/output model and optimize process parameters for obtaining a high-quality epitaxial layer and reducing the optimization cycle and costs. Notably, the optimized process was validated by real experiments, where the error between calculation and experiment is 4.03 % for deposition rate and 0.49 % for coefficient of variation, respectively. The results highlight the model as reliable and lay the foundation for the CVD growth of the 4H–SiC epitaxial layer.

This study demonstrates a breakdown analysis of the dynamics of a liquid crystal elastomer (LCE) including quality check, geometric measurement, thermal characterization, and comparison of heat- and light-induced contractions. A blue light-responsive acrylate side chain LCE with 1% azobenzene dye was characterized. From a classical viewpoint, photo-thermal contraction is considered a dominating effect, while direct photo-mechanical deformation can be neglected due to a low dye percentage. However, the findings of this research suggest that a low percentage of azobenzene dye does not necessarily lead to heat-dominating dynamics of LCE. This phenomenon has not yet been quantitatively studied before. The approach reported in this Letter can potentially be used to extract the data to improve the dynamics models of light-driven LCEs.

Driven by the increasing demand for high-power systems, ceramic substrates have received more attention for handling higher power density. Warpage in active metal brazed (AMB) ceramic substrate becomes a critical issue as it can deteriorate the reliability performance. This study comprises three phases, including investigation of the cause of the warpage, validation of the proposed model, and optimization for effective warpage management. At first, the coefficient of thermal expansion (CTE) and yield strength of the copper (Cu) layer in AMB were characterized and adopted in a two-dimensional (2D) finite element model. The evolution of simulated strain and moments revealed the cause of the warpage during the manufacturing processes. Furthermore, the 2D model was extended to a three-dimensional (3D) model. The finite element method (FEM) and experiments were conducted on different heat treatment conditions for 3D model validation. The validated 3D model was applied to carry out a design of experiments (DoEs) for design optimization to reduce the warpage. Consequently, the factor analysis in DoEs was demonstrated by different pattern designs using subtractive milling techniques.

Corrosion protection is one of the most important issues when copper is applied in power electronics packaging as bonding wire, die attachment, interconnection, and DBC substrate. Covering a layer of corrosion-resistant encapsulation material is a worthy consideration to protect copper. In this paper, the corrosion-resistant effects of two organic encapsulation materials, polydimethylsiloxane (PDMS) and hexamethyldisiloxane (HMDSO), on the copper surface were performed by molecular dynamics simulations. Firstly, the Cu-coating bilayer models were constructed, and the binding performances of the encapsulation material/copper interface were evaluated through calculating their interaction energy, proving that the organic coatings can form interconnection on copper surface. Then, the diffusion processes of corrosive gas molecules (H₂S, H₂O and O₂) into the copper layer under different coating conditions were simulated, and both coatings exhibited good corrosion protection performances. The above results indicate that both PDMS and HMDSO have promising potential for copper corrosion protection in power electronics packaging. This may provide some guidance for corrosion protection of copper material used in power electronics packaging.

The power semiconductor joining technology through sintering of copper nanoparticles is well-suited for die attachment in wide bandgap (WBG) semiconductors, offering high electrical, thermal, and mechanical performances. However, sintered nanocopper will be prone to degradation resulting from corrosion in sulfur-containing corrosive environments such as offshore areas. In this study, experiments, including aging test and corrosion characterization, and simulations based on density functional theory (DFT) studies were conducted to explore the corrosion behavior and mechanism of elemental sulfur (S₈) and hydrogen sulfide (H₂S) on sintered nanocopper. The experimental results indicated that loose corrosion products were observed on the sintered nanocopper during the ageing process involving S₈, and compact layered corrosion products formed during the ageing process involving H₂S. Furthermore, similar corrosion product compositions (Cu₂O, Cu₂S, CuO, CuS, and potentially Cu₂SO₄ or CuSO₄) were observed in both the S₈- and H₂S-ageing processes. However, the S₈-ageing process exhibited more noticeable corrosion penetration. This was explained in simulations results: the unsaturated Cu sites on the oxide layer [Cu₂O(1 1 1)] of the sintered nanocopper could adsorb both H₂S and S₈, while the saturated Cu sites only exhibited the potential to adsorb S₈.

Tungsten disulfide (WS2) has recently attracted considerable attention owing to its excellent physical, chemical, electronic, and optical properties, leading to increased research into its applications in electronic and optoelectronic devices. However, the oxidation of 2D material affects significantly its optical and electronic properties during storage or processing. This study employs density functional theory (DFT) to analyze the effects of natural and thermal oxidation on the optical and electronic properties of WS2 monolayer. First, the climbing-image nudged elastic band (cNEB) method is applied to analyze transitional states and the potential barriers of WS2 oxidation. It reveals that primarily involves the bonding of oxygen atoms with sulfur atoms, whereas thermal oxidation introduces both oxygen substitutions and generates oxygen vacancies. Second, the electron band structures after natural and thermal oxidation are comparably analyzed, which reveals that natural and thermal oxidation both can narrow the bandgap. Lastly, we investigate the optical properties of WS2 monolayer under different oxidation conditions. The results demonstrate that natural oxidation results in weakened light absorption and a blue shift relative to the pristine WS2, whereas thermal oxidation enhances absorption and induces a red shift. These findings underscore the importance of carefully managing oxidation conditions to effectively modulate the optoelectronic properties of WS2.

Silicon carbide (SiC) MOSFETs, as leading wide bandgap semiconductor devices, exhibit superior stability and reliability under high-temperature, high-switching frequencies, and high-power density operational conditions. SiC MOSFET with fan-out panel-level packaging (FOPLP) utilizes a redistribution layer (RDL) to substitute bonding wires, achieving low thermal resistance, electrical resistance, and parasitic inductance. This study proposes an optimal design strategy for SiC MOSFET FOPLP, considering parasitic inductance suppression, heat dissipation, thermal-mechanical reliability, and insulation enhancements. First, we establish the parasitic inductance, heat transfer network, and thermomechanical stress physical analytical models of SiC MOSFET FOPLP. Subsequently, the non-dominated sorting genetic algorithm (NSGA-II) and the improved multi-objective particle swarm optimization algorithm (MOPSO) are integrated to realize the co-optimization of parasitic inductance, thermal resistance, thermal stress, and electric field intensity distribution. Finally, we attain the optimal parameters of the SiC MOSFET FOPLP, i.e. chip thickness (x₁), solder thickness (x₂), RDL thickness (x₃), and chip side length (x₄) as 0.25 mm, 0.05 mm, 0.35 mm, and 6.00 mm, respectively. Additionally, according to comparison the MOPSO algorithm exhibits faster convergence and superior diversity than NAGA-II in the electrical-thermal-mechanical multiphysics co-optimization. Generally, the proposed physical analytical models combined with a multi-objective optimization method have a substantial guidance and forward-looking prospect on the design of SiC MOSFET FOPLP.

In the domain of power electronics, especially for applications requiring high power, high temperature, and high frequency, Silicon Carbide Metal Oxide Semiconductor Field-Effect Transistors (SiC MOSFETs) stand out due to their excellent properties such as high thermal conductivity, elevated breakdown electric field, and minimal power loss. These devices are pivotal in the reliability and safety of electric vehicles, where avalanche-induced failures represent a significant risk within automotive uses. This study extensively explores the avalanche ruggedness of both planar and trench SiC MOSFET configurations through a combination of Unclamped Inductive Switching (UIS) testing in single and multiple pulse scenarios, and Technology Computer-Aided Design (TCAD) simulations. Initial UIS experiments revealed the primary failure mechanisms and their origins in SiC MOSFETs. Following empirical analysis, TCAD simulations were employed to develop comprehensive models of these devices., enhancing the understanding of failure dynamics during UIS conditions. The integration of empirical and simulation data supports the creation of advanced strategies to reduce the risk of avalanche failures, thereby enhancing the durability and reliability of Wide Bandgap Semiconductor devices.