Avalanche Ruggedness Evaluation on Planar and Trench SiC MOSFETs
An Experimental and TCAD Simulation Study
Tao Luo (Fudan University)
Runding Luo (Fudan University)
Zaiman Xiang (Fudan University)
Jianjun Zhuang (Changzhou Galaxy Century Microelectronics)
Guo-Qi Zhang (TU Delft - Electronic Components, Technology and Materials)
Jiajie Fan (Fudan University, TU Delft - Electronic Components, Technology and Materials)
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Abstract
In the domain of power electronics, especially for applications requiring high power, high temperature, and high frequency, Silicon Carbide Metal Oxide Semiconductor Field-Effect Transistors (SiC MOSFETs) stand out due to their excellent properties such as high thermal conductivity, elevated breakdown electric field, and minimal power loss. These devices are pivotal in the reliability and safety of electric vehicles, where avalanche-induced failures represent a significant risk within automotive uses. This study extensively explores the avalanche ruggedness of both planar and trench SiC MOSFET configurations through a combination of Unclamped Inductive Switching (UIS) testing in single and multiple pulse scenarios, and Technology Computer-Aided Design (TCAD) simulations. Initial UIS experiments revealed the primary failure mechanisms and their origins in SiC MOSFETs. Following empirical analysis, TCAD simulations were employed to develop comprehensive models of these devices., enhancing the understanding of failure dynamics during UIS conditions. The integration of empirical and simulation data supports the creation of advanced strategies to reduce the risk of avalanche failures, thereby enhancing the durability and reliability of Wide Bandgap Semiconductor devices.