Residual stress and thermally induced warpage are critical reliability concerns in power electronic packaging, particularly when employing sintered copper nanoparticle (Cu NP) interconnects. While these interconnects provide high thermal and electrical performance, they also introduce significant interfacial stresses during bonding that alter mechanical behavior during service. This study develops an integrated confocal Raman–analytical modeling framework to directly quantify and mechanistically interpret these stresses in a representative SiC/Sintered Cu NPs/Active Metal Brazing ceramic substrate (AMB) stack. Raman spectroscopy reveals a compressive interfacial stress field peaking at −334 MPa near the chip center with localized hotspots linked to microporosity. Complementary in-situ Moiré interferometry tracked warpage evolution during thermal cycle (30–310°C). Coupling this stress measurement with a three-dimensional thermoelastic model, and explicitly assigning the bonding temperature as the stress-free reference, enables accurate reproduction of the temperature-dependent warpage trajectory. The model predictions align with experimental interferometry within < 5% deviation. These results demonstrate that incorporating residual stress is essential to realistically capture thermo-mechanical evolution. The proposed Raman–model paradigm advances beyond prior purely numerical or purely experimental efforts by bridging quantitative stress mapping with predictive warpage modeling. This methodology provides essential insights for thermal-induced residual stress and warpage managements in high-temperature power electronics packaging, providing a stress-informed foundation for reliability assessment and design optimization.

This study investigates the microstructure evolution and mechanical behavior of bimodal-sized sintered copper (Cu) nanoparticles (NPs) under varying sintering pressures. Micro-pillar compression tests reveal a transition from collapse-dominated to compaction-driven deformation as sintering pressure increases. Transmission electron microscopy (TEM) and transmission Kikuchi diffraction (TKD) analyses identify a two-stage deformation mechanism—initial pore compaction followed by intragranular slip—fundamentally distinct from bulk Cu. Molecular dynamics (MD) simulations further reveal that large particles promote dislocation-mediated plasticity by accommodating intragranular slip, while small particles enhance load transfer through localized shear-compaction, together enabling uniform strain distribution and supporting the experimentally observed strain accommodation. The resulting microstructure achieves a combination of high yield strength (up to 320 MPa) and low elastic modulus (20 GPa), offering a compliant yet robust response. These findings elucidate a unique processing–structure–property relationship and provide a rational basis for designing porous metal interconnects capable of withstanding thermomechanical stresses in advanced electronic packaging.

The mechanical strength of sintered nanoparticles (NPs) limits their application in advanced electronics packaging. In this study, we explore the anisotropy in the microstructure and mechanical properties of sintered copper (Cu) NPs by combining experimental techniques with molecular dynamics (MD) simulations. We establish a clear relationship between processing conditions, microstructural evolution, and resulting properties in pressure-assisted sintering of Cu NPs. Our findings reveal that pressure-assisted sintering induces significant anisotropy in the microstructure, as evidenced by variations in areal relative density and the orientation distribution of necks formed during sintering. Specifically, along the direction of applied pressure, the microstructure exhibits reduced variation in areal relative density and a higher prevalence of necks with favorable orientations. The resulting anisotropic mechanical properties, with significantly higher strength along the pressure direction compared to other directions, are demonstrated through micro-cantilever bending tests and tensile simulations. This anisotropy is further explained by the combined effects of strain localization (influenced by areal relative density) and the failure modes of necks (determined by their orientation relative to the loading direction). This work provides valuable insights into the analysis of sintered NPs microstructures and offers guidance for optimizing the sintering process.

This thesis systematically investigated themicrostructure evolution and mechanical behavior of sintered copper (Cu) nanoparticles (NPs) using an integrated approach combining multiscale simulations with micromechanical tests. The research addressed critical challenges in the design and optimization of sintered Cu for advanced electronic applications, with a focus on anisotropic fracture behavior, porosity-dependent properties, thermal effects, interfacial strength, particle morphology, and the role of ALD coatings.

Chapter 1 established the foundational context for this study by underscoring the significance of sintered Cu NPs in electronics packaging and identifying critical gaps in the existing literature. It defined the research objectives and outlined the thesis structure, emphasizing the necessity of an integrated experimental and computational approach to link microstructure evolution with mechanical performance.

Chapter 2 systematically investigated the influence of sintering pressure on the evolution of anisotropic microstructures in sintered Cu NPs. By integrating molecular dynamics (MD) simulations with micro-cantilever bending tests, the study revealed that uniaxial sintering pressure promoted preferential neck alignment along the loading direction, resulting in pronounced mechanical anisotropy. These findings underscored the critical role of processing parameters in governing microstructural orientation and, consequently, in tailoring the mechanical performance of sintered Cu NPs. This chapter established a foundational understanding of the process–structure–property relationships central to nanoparticle-based sintering.

Chapter 3 examined the influence of sintering pressure on densification and mechanical performance. Sintered Cu NPs exhibited a favorable combination of high strength and low elastic modulus, highlighting their suitability for electronic packaging. A two-stage deformation mechanism was identified, governed by the material’s porous architecture and heterogeneous microstructure. Initial compressive loading compacted voids and formed dense interparticle contacts, followed by plastic deformation primarily accommodated through intragranular slip.

Chapter 4 investigated the strain rate- and temperature-dependent viscoplastic behavior of sintered Cu NPs. Micro-pillar compression tests, coupled with the Anand viscoplastic model, revealed the competing effects of strain-rate hardening and thermal softening. Phase-field fracture simulations further elucidated the influence of porosity on crack initiation and propagation, providing critical insight into fracture mechanisms under varying loading conditions.

Chapter 5 focused on the interfacial strength and fracture behavior of sintered Cu NPs bonded to Cu substrates. Micro-cantilever bending tests and cohesive zone model (CZM) demonstrated that interface-notched specimens exhibited superior fracture resistance, with a stress intensity factor (KQ) of 2.88 ± 0.10 MPa·m1/2, compared to 2.12 ± 0.11 MPa·m1/2 for Cu NP-notched specimens. Simulations aligned with ex perimental results, showing that reduced fracture resistance in Cu NP-notched samples stemmed from porosity and stress concentration, while enhanced strength at the interface was attributed to strong bonding andminimized void formation.

Chapter 6 examined the effect of Cu particle morphology on densification and fracture toughness. Fracture resistance was found to be highly morphology-dependent: bimodal sintered Cu exhibited the greatest toughness, attributed to effective crack deflection and bridging. Monomodal Cu showed moderate resistance, while flake-shaped Cu displayed the lowest toughness, primarily due to weak interlamellar bonding and anisotropic porosity.

Chapter 7 revealed that the fracture toughness of sintered Cu NPs was strongly dependent on loading mode. Mode II (in-plane shear) exhibited the highest toughness due to shear-induced particle interlocking, followed by mode I (tensile) characterized by ductile tearing, and mode III (out-of-plane shear), which showed the lowest toughness due to triaxial stress and unstable crack propagation. The application of an Al2O3 coating enhanced fracture toughness across all modes, with the greatest improvement observed under shear-dominated and mixed-mode loading. The coating constrained surface deformation, delayed crack initiation, and strengthened interparticle boundaries, while preserving the intrinsic ductile fracture mechanism.

Chapter 8 concluded the thesis by synthesizing the key findings and outlining future research directions, including the mitigation of oxidation, investigation of sizedependent mechanical behavior, understanding of stiffness mismatch, and exploration of metamaterial-inspired design strategies.

This study investigates the interface strength and fracture behavior of sintered copper (Cu) nanoparticles (NPs) for all-Cu integration in advanced microelectronics packaging. Micro-cantilever bending tests on three configurations (Cu NP-notched, interface-notched and un-notched micro-cantilevers) were analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) and cohesive zone model (CZM). The interface-notched micro-cantilevers demonstrate superior fracture resistance, with a stress intensity factor (K_Q) of 2.88±0.10 MPa m^1/2, compared to 2.12±0.11 MPa m^1/2 for Cu NP-notched micro-cantilevers. Simulation results, consistent with experimental results, reveal that Cu NP-notched micro-cantilevers exhibit lower fracture resistance due to porosity and stress concentrations, while interface-notched micro-cantilevers show enhanced strength, attributed to robust bonding and reduced void distribution. Un-notched micro-cantilevers display superior load-bearing capacity, with cracks bypassing the interface and propagating through porous regions. Moreover, in un-notched micro-cantilevers, a synergistic deformation mechanism is observed, where crack propagation through the sintered Cu NPs coexists with plastic slip deformation in the Cu substrate. These findings highlight the strong interfacial bonding and effective stress transfer at the Cu substrate-sintered Cu NP interface, validating the feasibility of direct sintering using Cu NPs without additional coatings.

This study investigates the size-dependent mechanical behavior and deformation mechanisms of sintered copper (Cu) nanoparticles (NPs) through micro-pillar (2–6 μm diameter) compression tests, scanning electron microscopy (SEM), transmission electron microscopy (TEM), transmission Kikuchi diffraction (TKD) analysis and molecular dynamics (MD) simulations. In-situ micro-pillar compression tests reveal a 25.9% reduction in yield strength (812 ± 64 MPa to 643 ± 47 MPa) with increasing pillar size, attributed to dislocation starvation in smaller pillars and porosity-driven strain localization in larger ones. TKD quantifies dynamic grain refinement (24.9% reduction in grain size) and geometrically necessary dislocation (GND) density escalation (74.8%), driven by stress gradients and grain boundary-mediated plasticity. Nanoindentation-derived elastic modulus (48.3 ± 11.1 GPa) exceeds micropillar values (29.5–33.9 GPa), reflecting substrate constraints in bulk testing. Microstructural analysis identifies a transition from shear banding in high-porosity pillars to uniform plasticity in denser systems, mediated by texture evolution (Brass/S components) and Schmid factor redistribution (62% increase in high-slip-activity grains). MD simulations of pressure-sintered Cu NPs elucidate atomic-scale mechanisms: dislocation nucleation at sintering necks, pore collapse-induced strain localization, and grain boundary sliding. These findings establish a multiscale framework linking porosity, grain refinement, and dislocation dynamics to mechanical performance, emphasizing microstructural optimization for enhanced reliability in microelectronic applications. The integration of MD simulations bridges atomic-scale mechanisms to microscale deformation, providing actionable insights for tailoring sintered Cu NPs via reduced porosity and controlled grain boundary architectures.

Sintered Cu nanoparticles (NPs) are promising for high-performance electronics due to their excellent thermal and electrical conductivity, as well as mechanical reliability. This study investigates the microscale mechanical behavior of sintered Cu NPs with a bimodal particle size distribution, focusing on strain rate and temperature effects. Micro-pillar compression tests were performed across strain rates of 0.0001 s⁻¹ to 0.01 s⁻¹ and temperatures from 25 °C to 350 °C. Results show that higher strain rates enhance yield strength through strain-rate hardening, while elevated temperatures lead to thermal softening and reduced mechanical stability. The Anand viscoplastic model accurately predicts these deformation behaviors. Microstructural analysis via scanning electron microscopy (SEM) and transmission electron microscopy (TEM) reveals localized deformation at 175 °C, with dislocations concentrated near the top surface and persistent porosity below, whereas at 350 °C, re-sintering and grain boundary diffusion create a denser microstructure. Phase-field fracture modeling further elucidates crack propagation, emphasizing the role of pore size and temperature. This combined experimental and modeling approach enhances understanding of viscoplastic deformation and fracture mechanisms in sintered Cu NPs, informing their use in interconnects, power electronics and thermal management systems.

In this study, we combined finite element method (FEM) based on Ansys and Noesis Optimus software to investigate the effect of bump structures and loading conditions on the electromigration properties of solder bumps in WLCSP. A numerical model considering current density, vacancy concentration, stress and temperature was utilized to calculate the vacancy concentration in solder bumps. The Optimus is an optimization software which can be used to perform the design of experiment (DOE) and sensitivity analysis. To optimize the bump structure, the DOE and response surface modeling (RSM) analysis were performed by using Noesis Optimus. The design optimization based on Noesis Optimus has three main advantages. First, the sensitivity analysis based on DOE results helps to find the most contributing factors. Second, it saves huge time because hundreds of experiments can be executed automatically. Third, it is able to perform evolutionary design optimization directly on RSM to identify the design’s optimal performance point. The maximum and concentration around solder were selected as the index to evaluate the effect of parameter combination on electromigration properties.

Solder fatigue is a key failure mode in the electronic industry. Monitoring the actual degradation of the solder under real-time conditions in any application would be extremely beneficial. In this chapter, we describe the combination of experimental material characterization with numerical finite element (FE) simulations to obtain a prognostics and health monitoring (PHM) methodology for LED drivers used in outdoor lighting applications. Experimental characterization of a new type of solder is described. A FE model is created of a typical component in electronic drivers. The calculated damage level and the collected life data correlate together and form a model for predicting the lifetime of the drivers at certain user condition. The developed PHM methodology helps in identifying and reporting the failure of the driver in real time or can be used for predicting the actual remaining useful life (RUL).

To fulfill the high-temperature application requirement of high-power electronics packaging, Cu nanoparticle sintering technology, with benefits in low-temperature processing and high-melting point, has attracted considerable attention as a promising candidate for the die-attach interconnect. Comprehensive mechanical characterization of the sintered layer at a microscale is necessary to deepen the understanding of the fracture behavior and improve the reliable design of materials. In this study, microscale cantilevers with different notch depths were fabricated in a 20 MPa sintered interconnect layer. Continuous dynamical fracture testing of the microcantilevers was conducted in situ in a scanning electron microscope to detail the failure characteristic of the porous sintered structure. The microscopic fracture toughness of different notched specimens was obtained from the J-integral in the frame of elastic-plastic fracture mechanics. Specimens with deeper notches presented higher resistance to crack extension, while geometry factors of notch-to-width ratio between 0.20 and 0.37 exhibited a relatively stable microscopic fracture toughness ranging from 3.2 ± 0.3 to 3.6 ± 0.1 MPa m^1/2.

Silicon carbide (SiC) coated vertically aligned carbon nanotubes (VACNT) are attractive material for fabricating MEMS devices as an alternative for bulk micromachining of SiC. In order to examine the mechanical properties of SiC-CNT composites at high temperatures, we fabricated VACNT micro-pillars with different amounts of SiC coating and performed high-temperature micro-pillar compression on these samples. The indentation result shows that the coating can improve the elastic modulus up to three orders of magnitude. Samples were tested at room temperature, 300°C, 600°C, and 900°C under compressive load. No significant degradation of the mechanical properties was observed at elevated temperatures, demonstrating the harsh environment potential of this composite.

Additive manufacturing (AM) or 3D printing is a promising industrial technology that enables rapid prototyping of complex configurations. Powder Bed Fusion (PBF) is one of the most popular AM techniques for metallic materials. Until today, only a few metals and alloys are available for AM, e.g., titanium alloys, the most common of which is Ti-6Al-4V. After optimization of PBF parameters, with or without post processing such as heat treatment or hot isostatic pressing, the printed titanium alloy can easily reach tensile strengths of over 1100 MPa due to the quick cooling of the AM process. However, attributed to the unique features of metallurgical defects and microstructure introduced by this AM process, their fatigue strength has been low, often less than 30% of the tensile strength, especially in very-high-cycle regimes, i.e., failure life beyond 10⁷ cycles. Here, based on our group’s research on the very-high-cycle fatigue (VHCF) of additively manufactured (AMed) Ti-6Al-4V alloys, we have refined the basic quantities of porosity, metallurgical defects, and the AMed microstructure, summarized the main factors limiting their VHCF strengths, and suggested possible ways to improve VHCF performance.

As the dimensions of interconnects in integrated circuits continue to shrink, an urgent need arises to understand the physical mechanism associated with electromigration. Using x-ray nanodiffraction, we analyzed the stresses in Blech-structured pure Cu lines subjected to different electromigration conditions. The results suggest that the measured residual stresses in the early stages of electromigration are related to relaxation of stresses caused by thermal expansion mismatch, while a developing current-induced stress leads to reductions in the residual stress after longer test times. These findings not only validate the feasibility of measuring stress in copper lines using nanodiffraction but also highlight the need for a further understanding, particularly through in situ electromigration experiments with x-ray nanodiffraction analysis.

Electromigration (EM) is a crucial failure mode in Aluminum (Al) interconnection wires those are widely used in high density semiconductor packaging. This study systematically investigated the influence of EM on the mechanical properties of Al interconnects via nanoindentation experiments and molecular dynamics (MD) simulations. The results are list as follows. (1) The indentation depth gradually increases with the increase in indentation load, resulting in a gradual increase and stabilization of the Young’s modulus and hardness of the structure. Within a specific range, the influence of the loading rate on the indentation depth and mechanical properties is relatively small. (2) The region where Young’s modulus of the interconnect decreases correlates with the location where EM-induced voids initiate. EM-induced voids have a direct impact on the material’s mechanical properties, particularly the decrease in Young’s modulus. (3) These EM-induced voids affect the nucleation and formation of dislocations. With the increase in void concentration and indentation depth, The generation and slip of dislocations increase as the void concentration and indentation depth increase, leading to a decrease in the material’s mechanical properties over time. This comprehensive findings expand the knowledge on mechanical behavior degradation of Al interconnects when EM failure occurs, providing a scientific basis for designing and optimizing high density semiconductor packaging.

This study presents a dual approach combining molecular dynamics simulations and experimental analysis to explore the sintering behavior of copper (Cu) nanoparticles. Our simulation model comprises 240 nanoparticles, through which we systematically examine the coalescence kinetics during the sintering process. The simulations provide a detailed view of the particle interactions, structural evolution, and the mechanisms driving nanoparticle fusion at the atomic level. Complementing the simulations, we conducted 3D reconstructions using Focused Ion Beam Scanning Electron Microscopy (FIB-SEM) to characterize the microstructure of the sintered nanoparticles. This hybrid approach not only deepens our understanding of the fundamental processes governing the sintering of Cu nanoparticles but also bridges the gap between theoretical predictions and experimental observations, offering insights into the optimization of sintering processes in practical applications.

This report demonstrates an innovative method to achieve large scale 20 μm pitch Cu-Cu direct bonding, utilizing lithographic stencil printing to transfer small-sized nano-copper (CuNPs) paste and employs a thermocompression method for CuNPs sintering to establish interconnections between copper-pillars and CuNPs bumps. Shear tests were conducted to characterize the bonding strength. High-throughput 20 μm pitch copper-to-copper direct bonding enables lower annealing temperatures for bulk-Cu to bulk-Cu bonding. Lithographic stencil printing is used to transfer the CuNPs paste, followed by sintering of the nanoparticles to establish interconnections. Shear tests and cross-section SEM were conducted to characterize the bonding strength and quality.

As a promising technology for high-power and high-temperature power electronics packaging, nanocopper (nanoCu) paste sintering has recently received increasing attention as a die-attachment. The high-temperature deformation of sintered nanoCu paste and its underlying mechanisms challenge the reliability of high-power electronics packaging. In this study, the tensile deformation behaviors of sintered nanoCu paste were firstly characterized by high-temperature tensile tests performed at various temperatures and strain rates ranging from 180 °C to 360 °C, 1 × 10⁻⁴ s⁻¹ to 1 × 10⁻³ s⁻¹ respectively. It was found that the elastic modulus and tensile strength decreased at the higher tensile temperature while the ductility increased accordingly. The highest elastic modulus and tensile strength results were 12.15 GPa and 46.97 MPa, respectively. Second, failure analysis was conducted based on the fracture surface after tensile testing. Recrystallization was revealed as the main factor for ductility improvement. Subsequently, an Anand model was fitted by stress-strain curves to describe the tensile constitutive behavior of the sintered nanoCu paste. Multi-scale modelling techniques also investigated the impact of tensile temperature and strain rate on the tensile response. Molecular dynamics simulation was implemented using a hemispherical Cu nanoparticle model to reveal the properties from an atomistic perspective. In addition, a two-dimensional equivalent model was further established by using a stochastically distributed void morphology. The multi-scale modelling techniques successfully describe the evolution of tensile response to the different tensile temperatures and strain rates. Besides, the equivalent model with random void morphology was demonstrated as the finite element simulation results were highly consistent with the high-temperature tensile experiments.

The trend to 3D and heterogeneous integration enable driving multi-functional blocks in one package. Flip-chip integration is currently playing an important role and is based on solder joints. To overcome the limitations of solder joints, all-copper interconnects have been investigated to meet electrical, thermal, and reliability demands in 3D integration. The underfill process is widely applied in flip-chip encapsulation technology. We propose a novel wafer-scale all-Cu interconnect method combining epoxy-based photo-patternable polymer as self-aligned underfill layer with the patterned copper nanoparticles interconnects. The resulting test wafers were able to pattern 20 µm pitch copper nanoparticle-paste interconnects on both substrates with and without photoimageable polymer. The Cu paste was applied to form the interconnects and was sintered after bonding process. Free-standing nanocopper is sintered to obtain mechanical properties with a Young's modulus of 112 GPa. All-Cu interconnects with diameter of 50 µm and 100 µm were measured to achieve the specific contact resistance, ranging from 1.4 × 10-5O· cm2 to 1.0 × 10-5O· cm2 at different sintering temperature when epoxy-based underfill existing. And its resistivity was 4.54× 10-4 O· cm, compared to 5.86× 10-4O· cn for the all-Cu interconnects without underfill.

The stress–strain response of sintered silver nanoparticles (AgNP) materials is precisely characterized in order to adapt for numerical analysis and rational design of electronic packaging structures in this study. A framework of crystal plasticity finite element method (CPFEM) is established based on the mechanism of crystal plastic deformation to describe the mesoscopic structural influence of grain evolution on the macroscopic properties of sintered AgNP materials. Material parameters of crystal plasticity are defined and initial orientations are randomly assigned for sintered AgNP grains. To calibrate the mesoscopic mechanical properties of sintered AgNP by the proposed CPFEM, the results of CPFEM simulations and uniaxial tensile tests subjected to different strain rates and temperatures are compared in terms of the stress–strain curves as the critical macroscopic characteristics. The predicted stress and deformation distributions in the polycrystalline structure demonstrate that the significant inhomogeneity of stress and deformation is caused by the different grain orientations of sintered AgNP. Furthermore, we elucidate the fracture mechanism influenced by the temperature and strain rate and also the effect of initial crystal orientation on the plastic strain of sintered AgNP. This study sheds light on the morphology design of sintered AgNP with optimized mechanical properties and fatigue resistance.

The application of microporous sintered copper (Cu) as a bonding material to replace conventional die-attach materials in power electronic devices has attracted considerable interest. Many previous studies have focused on the effect of processing parameters (temperature, time, pressure) on the microstructure evolution of sintered Cu. However, there are only a few studies with regard to the mechanical properties of sintered Cu. As the die-attach layer undergoes thermal and mechanical stress during its application, it is essential to investigate the micro-scale mechanical properties of sintered Cu. Fracture toughness is a measure of the resistance of a material to crack propagation under predominantly linear-elastic conditions, which is an essential parameter for predicting fracture failure. As cracks and defects are difficult to avoid during fabrication and application processing for sintered Cu, which will definitely cause a significant effect on micromechanical properties. Thus, it is essential to reveal the effect of microstructure on fracture toughess of sintered Cu nanoparticles.