Tailoring microstructure and mechanical properties of sintered Cu nanoparticles

Journal Article (2025)
Author(s)

Leiming Du (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Gerald Schaffar (Montan University of Leoben)

Weiping Jiao (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Kai Liu (TU Delft - Mechanical Engineering)

René H. Poelma (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Jiajie Fan (Fudan University)

Willem D. van Driel (TU Delft - Electrical Engineering, Mathematics and Computer Science)

Xuejun Fan (Lamar University)

Guoqi Zhang (TU Delft - Electrical Engineering, Mathematics and Computer Science)

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Research Group
Electronic Components, Technology and Materials
DOI related publication
https://doi.org/10.1016/j.actamat.2025.121501 Final published version
More Info
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Publication Year
2025
Language
English
Research Group
Electronic Components, Technology and Materials
Journal title
Acta Materialia
Volume number
300
Article number
121501
Downloads counter
207
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Abstract

This study investigates the microstructure evolution and mechanical behavior of bimodal-sized sintered copper (Cu) nanoparticles (NPs) under varying sintering pressures. Micro-pillar compression tests reveal a transition from collapse-dominated to compaction-driven deformation as sintering pressure increases. Transmission electron microscopy (TEM) and transmission Kikuchi diffraction (TKD) analyses identify a two-stage deformation mechanism—initial pore compaction followed by intragranular slip—fundamentally distinct from bulk Cu. Molecular dynamics (MD) simulations further reveal that large particles promote dislocation-mediated plasticity by accommodating intragranular slip, while small particles enhance load transfer through localized shear-compaction, together enabling uniform strain distribution and supporting the experimentally observed strain accommodation. The resulting microstructure achieves a combination of high yield strength (up to 320 MPa) and low elastic modulus (20 GPa), offering a compliant yet robust response. These findings elucidate a unique processing–structure–property relationship and provide a rational basis for designing porous metal interconnects capable of withstanding thermomechanical stresses in advanced electronic packaging.