Print Email Facebook Twitter Inverse Electromagnetics for EUV mask metrology and inspection Title Inverse Electromagnetics for EUV mask metrology and inspection Author Ansuinelli, P. (TU Delft ImPhys/Optics) Contributor Coene, W.M.J.M. (promotor) Urbach, Paul (promotor) Degree granting institution Delft University of Technology Date 2022-03-09 Abstract The importance of inverse problems is paramount in science and physics because their solution provides information about parameters that cannot be directly observed. This thesis discusses and details the application of a few inverse methods in optical imaging, metrology and inspection of lithographic targets, particularly patterned structures on top of an extreme ultraviolet (EUV) lithographic mask... Subject inverse problemsscatterometryphase retrievalEUV mask inspection and metrology To reference this document use: https://doi.org/10.4233/uuid:7c5d0326-c293-4f5a-a926-edf7358f6510 ISBN 9789464237009 Part of collection Institutional Repository Document type doctoral thesis Rights © 2022 P. Ansuinelli Files PDF PA_thesis.pdf 5.67 MB Close viewer /islandora/object/uuid:7c5d0326-c293-4f5a-a926-edf7358f6510/datastream/OBJ/view