Photolithography on bulk micromachined substrates

Photolithography on high topography substrates, such as the sidewalls or the bottom of cavities and trenches created by bulk micromachining, enables the design of complex three-dimensional structures. When a contact lithography system is used to pattern such substrates, local gaps exist between the mask and the substrate. In this paper we...

A dual-side fabrication method for silicon plate springs with high out-of-plane stiffness

Thin photodiodes for a scintillator-silicon well detector