Ricciardella, F. (author), Vollebregt, S. (author), Tilmann, Rita (author), Hartwig, Oliver (author), Bartlam, Cian (author), Sarro, Pasqualina M (author), Sachdev, Hermann (author), Duesberg, Georg S. (author) Chemical vapor deposition (CVD) has been demonstrated as a highly promising technique for the production of graphene on large scale and enabling tunability of the intrinsic defects of the films during the synthesis.<br/><br/>In this work, we report on the correlation between the density of defects (DoD) and the kinetics of interaction of multi...
journal article 2021
