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Hijzen, E.A. (author), Schooneveld, E.M. (author), van Eijk, C.W.E. (author), Hollander, R.W. (author), Sarro, P.M. (author), van den Bogaard, A. (author)
journal article 1994
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French, P.J. (author), van Drieenhuizen, B.P. (author), Poenar, D. (author), Goosen, J.F.L. (author), Mallee, R. (author), Sarro, P.M. (author), Wolffenbuttel, R.F. (author)
journal article 1996
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Kwa, T.A. (author), Sarro, P.M. (author), Wolffenbuttel, R.F. (author)
journal article 1997
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Vdovin, G. (author), Middelhoek, S. (author), Sarro, P.M. (author)
The technology of low-cost high-quality micromachined adaptive mirrors is reported. Adaptive mirrors are fabricated by combining bulk silicon micromachining with standard electronics technologies. Mirrors with tens of control channels, having RMS initial deviation from plane of the order of ?/20 and a range of surface deflection of 10 to 20 ?m...
journal article 1997
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Sonsky, J. (author), Valk, H. (author), Huizenga, J. (author), Hollander, R.W. (author), van Eijk, C.W.E. (author), Sarro, P.M. (author)
journal article 1999
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Sonsky, J. (author), Valk, H. (author), Allier, C.P. (author), Hollander, R.W. (author), van Eijk, C.W.E. (author), Sarro, P.M. (author)
journal article 1999
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Allier, C.P. (author), Hollander, R.W. (author), Sarro, P.M. (author), Van Eijk, C.W.E. (author)
journal article 1999
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Allier, C.P. (author), Hollander, R.W. (author), Sarro, P.M. (author), de Boer, M. (author), van Eijk, C.W.E. (author)
journal article 2000
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Sonsky, J. (author), Huizenga, J. (author), Hollander, R.W. (author), van Eijk, C.W.E. (author), Sarro, P.M. (author)
journal article 2000
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Sonsky, J. (author), Hollander, R.W. (author), van Eijk, C.W.E. (author), Sarro, P.M. (author), Kouchpil, V. (author)
journal article 2001
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Sarro, P.M. (author), Ng, K.T. (author), Burghartz, J.N. (author)
journal article 2001
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Allier, C.P. (author), Hollander, R.W. (author), van Eijk, C.W.E. (author), Sarro, P.M. (author), de Boer, M. (author), Czirr, J.B. (author), Chaminade, J.P. (author), Fouassier, C. (author)
journal article 2001
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Iordanov, V.P. (author), Bastemeijer, J. (author), Ishihara, R. (author), Sarro, P.M. (author), Bossche, A. (author), Vellekoop, M.J. (author)
journal article 2004
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Boellaard, E. (author), Burghartz, J.N. (author), Sarro, P.M. (author)
journal article 2004
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Pham, N.P. (author), Burghartz, J.N. (author), Sarro, P.M. (author)
journal article 2005
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Pham, H.T.M. (author), De Boer, C.R. (author), Visser, C.C.G. (author), Sarro, P.M. (author)
In this paper, we present a systematic investigation of the influence of the deposition parameters on the deposition rate, etch rate, and mechanical stress of SiC films prepared by plasma-enhanced chemical vapor deposition (PECVD) technique. Among the relevant deposition parameters, the SiH4 gas flow rate, the main parameter to determine the Si...
journal article 2005
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Lau, G.K. (author), Goosen, J.F.L. (author), Van Keulen, F. (author), French, P.J. (author), Sarro, P.M. (author)
journal article 2006
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Duc, T.C. (author), Creemer, J.F. (author), Sarro, P.M. (author)
journal article 2006
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Henneken, V.A. (author), Tichem, M. (author), Sarro, P.M. (author)
journal article 2006
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Nguyen, N.T. (author), Wien, W.A.H. (author), Schellevis, H. (author), Sarro, P.M. (author), Burghartz, J.N. (author)
journal article 2006
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