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Kinetics and Characterization of Tungsten CVD Processes

Ammerlaan, J.A.M. (author)

doctoral thesis 1994

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Kinetics of tungsten low-pressure chemical-vapor deposition using WF6 and SiH4 studied by in situ growth-rate measurements

Ammerlaan, J.A.M. (author), Van der Put, P.J. (author), Schoonman, J. (author)

journal article 1993

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Kinetics and mechanism of tungsten LPCVD using tungsten hexafluoride and silane studied by in-situ growth rate measurements

Ammerlaan, J.A.M. (author), Van der Put, P.J. (author), Schoonman, J. (author)

conference paper 1993

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Chemical vapour deposition of tungsten by H2 reduction of WCl6. Fourth European workshop on refractory metals and silicides: Selected papers, Saltsjobaden, Sweden, March 24-27, 1991

Ammerlaan, J.A.M. (author), Boogaard, D.R.M. (author), Van der Put, P.J. (author), Schoonman, J. (author)

journal article 1991