Searched for: author:"Van den Hout, M."
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document
Zagwijn, P.M. (author), Verweij, W. (author), Pierreux, D. (author), Noureddine, A. (author), Bankras, R. (author), Oosterlaken, E. (author), Snijders, G.J. (author), Van den Hout, M. (author), Fischer, P. (author), Wilhelm, R. (author), Knapp, M. (author)
This article describes a novel CVD process for TiN films developed in a 300 mm Vertical Furnace. We have solved Chlorine incorporation at low temperature inside the TiN layer while at the same time the batch process yields a 3 times higher throughput per dual reactor system compared to a single wafer system with 3 chambers.We show process...
journal article 2009
document
Zagwijn, P.M. (author), Verweij, W. (author), Pierreux, D. (author), Noureddine, A. (author), Bankras, R. (author), Oosterlaken, E. (author), Snijders, G.J. (author), Van den Hout, M. (author), Fischer, P. (author), Wilhelm, R. (author), Knapp, M. (author)
journal article 2008