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Searched for: department%3A%22Imaging%255C%252BScience%255C%252Band%255C%252BTechnology%22
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Limiting factors for electron beam lithography when using ultra-thin hydrogen silsesquioxane layers
Grigorescu, A.E. (author), Van der Krogt, M.C. (author), Hagen, C.W. (author)
journal article 2007
