Adaptive Optics to Counteract Thermal Aberrations: System Design for EUV-Lithography with Sub-nm Precision

In highly precise systems the thermal expansion of system-parts is of increasing concern, since it can severely compromise its performance at sub-nanometre level. An example of such a system is an Extreme UltraViolet (EUV)-lithography machine that is used in the semi-conductor industry to project the pattern of the chip onto a silicon wafer. In...