Gold(I) N-heterocyclic carbene precursors for focused electron beam-induced deposition

Seven gold(I) N-heterocyclic carbene (NHC) complexes were synthesized, characterized, and identified as suitable precursors for focused electron beam-induced deposition (FEBID). Several variations on the core Au(NHC)X moiety were introduced, that is, variations of the NHC ring (imidazole or triazole), of the alkyl N-substituents (Me, Et, or...

Combined focused electron beam-induced deposition and etching for the patterning of dense lines without interconnecting material

High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron...

Electron beam-induced deposition of platinum from Pt(CO)₂Cl₂ and Pt(CO)₂Br₂

Two platinum precursors, Pt(CO)₂Cl₂ and Pt(CO)₂Br₂, were designed for focused electron beam-induced deposition (FEBID) with the aim of producing platinum deposits of higher purity than those deposited from commercially available precursors. In this work, we present the first deposition experiments...

Towards osteogenic and bactericidal nanopatterns?

Recent discoveries have shown that nanopatterns with feature sizes ≤100 nm could direct stem cell fate or kill bacteria. These effects could be used to develop orthopedic implants with improved osseointegration and decreased chance of implant-associated infections. The quest for osteogenic and bactericidal nanopatterns is ongoing but no...

A study of the reproducibility of electron beam induced deposition for sub-20 nm lithography

The potential of Electron Beam Induced Deposition (EBID) to become a reliable and reproducible direct-write nanopatterning technique has been investigated. A key requirement is that patterns of sub-20 nm dimension can be reproducibly fabricated and measured. EBID was used for the controlled fabrication of sub-20 nm dense lines on bulk silicon...

Sealing graphene nanodrums

Despite theoretical predictions that graphene should be impermeable to all gases, practical experiments on sealed graphene nanodrums show small leak rates. Thus far, the exact mechanism for this permeation has remained unclear, because different potential leakage pathways have not been studied separately. Here, we demonstrate a sealing method...

Electron transport and room temperature single-electron charging in 10 nm scale PtC nanostructures formed by electron beam induced deposition

Nanostructures of platinum-carbon nanocomposite material have been formed by electron-beam induced deposition. These consist of nanodots and nanowires with a minimum size ∼20 nm, integrated within ∼100 nm nanogap n-type silicon-on-insulator transistor structures. The nanodot transistors use ∼20 nm Pt/C nanodots, tunnel-coupled to Pt/C...

Core-Shell Plasmonic Nanohelices

We introduce core-shell plasmonic nanohelices, highly tunable structures that have a different response in the visible for circularly polarized light of opposite handedness. The glass core of the helices is fabricated using electron beam induced deposition and the pure gold shell is subsequently sputter coated. Optical measurements allow us...

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: The role of dissociative ionization and dissociative electron attachment in the deposition process

We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds and we compare the proximity effect observed for these...

Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition

To demonstrate the possibility of using electron beam-induced deposition (EBID) masks for sub-10 nm pattern transfer into silicon, first experiments were carried out by using 20- to 40-nm EBID masks, which were etched by different chemistries. It is experimentally verified that recipes based on hydrogen bromide, chlorine, and boron trichloride...

Size and shape control of sub-20 nm patterns fabricated using focused electron beam-induced processing

In a first study to analyze the feasibility of electron beam-induced deposition (EBID) for creating certain patterns in advanced lithography, line patterns were fabricated on silicon wafers using EBID. The growth conditions were such that the growth rate is fully determined by the electron flux (the current limited growth regime). It is...

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Focused electron beam induced processing (FEBIP) of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor’s ligand...

Electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV): Total cross section as a function of incident electron energy

The total cross section has been measured for the electron induced dissociation of trimethyl (methylcyclopentadienyl) platinum (IV) [MeCpPt(IV)Me3], a Pt precursor often used in focused electron beam induced processing (FEBIP), for incident electron energies ranging between 3–3 keV. Measurements were performed for the precursor in the adsorbed...