Gas-phase Deposition of Thin Aluminium Oxide Films at Ambient Conditions

Particles are widely used in the chemical industry as raw material and end product. In many applications of particles, it is advantageous to give them a coating that can either protect the particle from outside influences or give it an additional function. Technologies to provide micron-sized particles with relatively thick coatings (in the...

Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15...

Characterization of low temperature deposited atomic layer deposition TiO2 for MEMS applications

TiO2 is an interesting and promising material for micro-/nanoelectromechanical systems (MEMS/NEMS). For high performance and reliable MEMS/NEMS, optimization of the optical characteristics, mechanical stress, and especially surface smoothness of TiO2 is required. To overcome the roughness issue of the TiO2 films due to crystallization during...

Crystal structure and band gap determination of HfO2 thin films

Valence electron energy loss spectroscopy (VEELS) and high resolution transmission electron microscopy (HRTEM) are performed on three different HfO2 thin films grown on Si (001) by chemical vapor deposition (CVD) or atomic layer deposition (ALD). For each sample the band gap (Eg) is determined by low-loss EELS analysis. The Eg values are then...