Aggregation Phenomena in Atomic Layer Deposition: Bridging Macro and Nano

Atomic layer deposition (ALD) is a gas-phase thin film technology that boasts atomic-level control over the amount of material being deposited. A great deal of research effort has been devoted to the exploitation of ALD precision for the synthesis of nanostructures other than thin films such as supported nanoparticles (NPs). ALD is not only...

Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows coating heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15...

Fluidization of nanopowders: A review

Nanoparticles (NPs) are applied in a wide range of processes, and their use continues to increase. Fluidization is one of the best techniques available to disperse and process NPs. NPs cannot be fluidized individually; they fluidize as very porous agglomerates. The objective of this article is to review the developments in nanopowder...