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Bouwens, MAJ (author), Maas, D (author), van der Donck, JCJ (author), Alkemade, P.F.A. (author), van der Walle, P (author)
To qualify tools of semiconductor manufacturing, particles unintentionally deposited in these tools are character-ized using blank wafers. With fast optical inspection tools one can quickly localize these particle defects. An ex-ample is TNO's Rapid Nano, which operates in optical darkfield. The next step is defect review for further...
journal article 2016