Combined focused electron beam-induced deposition and etching for the patterning of dense lines without interconnecting material

High resolution dense lines patterned by focused electron beam-induced deposition (FEBID) have been demonstrated to be promising for lithography. One of the challenges is the presence of interconnecting material, which is often carbonaceous, between the lines as a result of the Gaussian line profile. We demonstrate the use of focused electron...

High resolution resist-free lithography in the SEM

Focussed Electron Beam Induced Processing is a high resolution direct-write nanopatterning technique. Its ability to fabricate sub-10 nm structures together with its versatility and ease of use, in that it is resist-free and implementable inside a Scanning Electron Microscope, make it attractive for a variety of applications in nanofabrication....

Radial polarization and beam shaping to sharpen the electric field in focus