Micro-patterned diamond has been investigated for numerous applications, such as biomimetic surfaces, electrodes for cell stimulation and energy storage, photonic structures, imprint lithography, and others. Controlled patterning of diamond substrates and moulds typically requires lithography-based top-down processing, which is costly and complex. In this work, we introduce an alternative, cleanroom-free approach consisting of the bottom-up growth of nanocrystalline diamond (NCD) micropillar arrays by chemical vapour deposition (CVD) using a commercial porous Si membrane as a template. Conformal pillars of ~4.7 μm in height and ~2.2 μm in width were achieved after a maximum growth time of 9 h by hot-filament CVD (2% CH ₄ in H ₂ , 725 °C at 10 mbar). In order to demonstrate one of many possible applications, micropillar arrays grown for 6 h, with ~2 μm in height, were evaluated as moulds for imprint lithography by replication onto hard cyclic olefin copolymer (COC) and onto soft polydimethylsiloxane (PDMS) elastomer. The results showed preserved mechanical integrity of the diamond moulds after replication, as well as full pattern transfer onto the two polymers, with matching dimensions between the grown pillars and the replicated holes. Prior surface treatment of the diamond mould was not required for releasing the PDMS replica, whereas the functionalisation of the diamond surface with a perfluorododecyltrichlorosilane (FDDTS) anti-stiction layer was necessary for the successful release of the COC replica from the mould. In summary, this paper presents an alternative and facile route for the fabrication of diamond micropillar arrays and functional micro-textured surfaces.

B-doped diamond has become the ultimate material for applications in the field of microelectromechanical systems (MEMS), which require both highly wear resistant and electrically conductive diamond films and microstructures. Despite the extensive research of the tribological properties of undoped diamond, to date there is very limited knowledge of the wear properties of highly B-doped diamond. Therefore, in this work a comprehensive investigation of the wear behavior of highly B-doped diamond is presented. Reciprocating sliding tests are performed on micro- and nanocrystalline diamond (MCD, NCD) films with varying B-doping levels and thicknesses. We demonstrate a linear dependency of the wear rate of the different diamond films with the B-doping level. Specifically, the wear rate increases by a factor of 3 between NCD films with 0.6 and 2.8 at. % B-doping levels. This increase in the wear rate can be linked to a 50% decrease in both hardness and elastic modulus of the highly B-doped NCD films, as determined by nanoindentation measurements. Moreover, we show that fine-grained diamond films are more prone to wear. Particularly, NCD films with a 3× smaller grain size but similar B-doping levels exhibit a double wear rate, indicating the crucial role of the grain size on the diamond film wear behavior. On the other hand, MCD films are the most wear-resistant films due to their larger grains and lower B-doping levels. We propose a graphical scheme of the wear behavior which involves planarization and mechanochemically driven amorphization of the surface to describe the wear mechanism of B-doped diamond films. Finally, the wear behavior of the nucleation surface of NCD films is investigated for the first time. In particular, the nucleation surface is shown to be susceptible to higher wear compared to the growth surface due to its higher grain boundary line density.