Noble metal nanoparticles (NPs), particularly platinum (Pt), are widely used in heterogeneous catalysis due to their exceptional activity. However, controlling their size and preventing sintering during synthesis remains a major challenge, especially when aiming for high dispersi
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Noble metal nanoparticles (NPs), particularly platinum (Pt), are widely used in heterogeneous catalysis due to their exceptional activity. However, controlling their size and preventing sintering during synthesis remains a major challenge, especially when aiming for high dispersion and stability on supports such as graphene. Atomic layer deposition (ALD) has emerged as a promising method to address these issues, yet conventional processes often lead to broad particle size distributions (PSDs). This work introduces a new approach for the deposition of size-controlled and sintering-resistant Pt NPs on graphene by atmospheric-pressure ALD using MeCpPtMe3and O2. In this approach, the deposition temperature varies in a cyclic manner in accordance with the Pt precursor and the O2exposure steps. In every ALD cycle, the MeCpPtMe3exposure is carried out at either 150 or 200 °C, and the O2exposure is at room temperature. The room-temperature step hinders the diffusion and coalescence of Pt NPs, resulting in significantly narrower PSDs compared to those achieved by the conventional ALD processes at 150 and 200 °C. Importantly, Pt NPs with narrower PSDs exhibit higher catalytic activity and improved stability, which are demonstrated for the propene oxidation reaction, despite having a significantly lower Pt loading. Our approach may open a new avenue toward the size-selection synthesis of noble metal NPs for catalytic applications.