KR
K. Rishav
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The characterization of optical anisotropy in thin van der Waals (vdW) materials is crucial for both fundamental studies and nanophotonic applications. However, conventional techniques such as spectroscopic ellipsometry face significant limitations in measuring out-of-plane aniso
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Global optimization in optical design is particularly challenging for aspheric and freeform surfaces due to their complex, non-symmetric nature and the presence of numerous local minima in high-dimensional design spaces. Traditional optimization methods often struggle to efficien
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