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document
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Kuruganti, V.V. (author), Mazurov, Alexander (author), Seren, Sven (author), Isabella, O. (author), Mihailetchi, Valentin D. (author)
In this work, we developed an in situ annealing process to crystallize boron-doped amorphous silicon [a-Si(p+)] layers deposited by atmospheric pressure chemical vapour deposition (APCVD) to form boron-doped polycrystalline silicon [poly-Si(p+)] layers. The influence of the temperature profiles during a-Si(p+) inline deposition on structural,...
journal article 2023
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