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document
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Mimoun, B.A.Z. (author), Pham, H.T.M. (author), Henneken, V. (author), Dekker, R. (author)
The authors have found that patterning polyimide coatings containing organosilane adhesion promoter using pure oxygen plasma resulted in a thin silicon-rich residue layer. They show in this paper that adding small amounts of fluorine-containing gas to the etching gas mixture is necessary in order to achieve residue-free polyimide plasma etching....
journal article 2013
Source URL (retrieved on 2024-05-19 22:46): https://repository.tudelft.nl/islandora/search/department%3A%22Microelectronics%22?f%5B0%5D=mods_name_personal_author_namePart_family_ss%3A%22Dekker%22&f%5B1%5D=mods_subject_topic_ss%3A%22polymer%5C%20films%22