Process control in plasma decapsulation: Preventing damage to the copper wire bonds and controlled removal of Si3N4 passivation layer

Conference paper (2012)

Authors

J. Tang Electronic Components, Technology and Materials - EEMCS
C.I.M. Beenakker Electronic Components, Technology and Materials - EEMCS
JBJ Schelen External organisation
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2012

Language

English

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials