Materials with a high secondary-electron yield for use in plasma displays

Journal article (2002)

Authors

T Vink Philips Research
R. Balkenende Philips Research
R.G.F.A. Verbeek Philips Research
H.A.M. Van Hal Philips Research
S.T. De Zwart Philips Research
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Published Date

25-03-2002

Language

English

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Abstract

Reduction of the firing voltage in plasma display panels calls for electrode coatings with a high secondary-electron yield. We have explored a range of materials that exhibit very low firing voltages, and a 50% reduction has been achieved relative to the best quality MgO. It is further shown that a high electron emission yield originates from both ion- and photon-induced processes, and is strongly influenced by the electronic structure of the material in terms of band gap and electron affinity.