Materials with a high secondary-electron yield for use in plasma displays
T Vink (Philips Research)
R. Balkenende (Philips Research)
R.G.F.A. Verbeek (Philips Research)
H. A.M. Van Hal (Philips Research)
S.T. De Zwart (Philips Research)
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Abstract
Reduction of the firing voltage in plasma display panels calls for electrode coatings with a high secondary-electron yield. We have explored a range of materials that exhibit very low firing voltages, and a 50% reduction has been achieved relative to the best quality MgO. It is further shown that a high electron emission yield originates from both ion- and photon-induced processes, and is strongly influenced by the electronic structure of the material in terms of band gap and electron affinity.
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