Materials with a high secondary-electron yield for use in plasma displays

Journal Article (2002)
Author(s)

T Vink (Philips Research)

R. Balkenende (Philips Research)

R.G.F.A. Verbeek (Philips Research)

H. A.M. Van Hal (Philips Research)

S.T. De Zwart (Philips Research)

Affiliation
External organisation
DOI related publication
https://doi.org/10.1063/1.1464229
More Info
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Publication Year
2002
Language
English
Affiliation
External organisation
Issue number
12
Volume number
80
Pages (from-to)
2216-2218

Abstract

Reduction of the firing voltage in plasma display panels calls for electrode coatings with a high secondary-electron yield. We have explored a range of materials that exhibit very low firing voltages, and a 50% reduction has been achieved relative to the best quality MgO. It is further shown that a high electron emission yield originates from both ion- and photon-induced processes, and is strongly influenced by the electronic structure of the material in terms of band gap and electron affinity.

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