Bas-Relief Modeling from Normal Layers
Mingqiang Wei (Nanjing University of Aeronautics and Astronautics)
Yang Tian (The Chinese University of Hong Kong, Chinese Academy of Sciences)
Wai-Man Pang (Caritas Institute of Higher Education)
Charlie C.L. Wang (TU Delft - Industrial Design Engineering)
Ming-Yong Pang (Nanjing Normal University)
Jun Wang (Nanjing University of Aeronautics and Astronautics)
Jin Qin (The Hong Kong Polytechnic University)
Pheng-Ann Heng (Chinese Academy of Sciences, The Chinese University of Hong Kong)
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Abstract
Bas-relief is characterized by its unique presentation of intrinsic shape properties and/or detailed appearance using materials raised up in different degrees above a background. However, many bas-relief modeling methods could not manipulate scene details well. We propose a simple and effective solution for two kinds of bas-relief modeling (i.e., structure-preserving and detail-preserving), which is different from the prior tone mapping alike methods. Our idea originates from an observation on typical 3D models which are decomposed into a piecewise smooth base layer and a detail layer in normal field. Proper manipulation of the two layers contributes to both structure-preserving and detail-preserving bas-relief modeling. We solve the modeling problem in a discrete geometry processing setup that uses normal-based mesh processing as a theoretical foundation. Specifically, using the two-step mesh smoothing mechanism as a bridge, we transfer the bas-relief modeling problem into a discrete space, and solve it in a least-squares manner. Experiments and comparisons to other methods show that (i) geometry details are better preserved in the scenario with high compression ratios, and (ii) structures are clearly preserved without shape distortion and interference from details.