Monte Carlo Modeling of Electron Multiplication in Amorphous Silicon Based Microchannel Plates
J Loffler (École Polytechnique Fédérale de Lausanne)
J. Thomet (École Polytechnique Fédérale de Lausanne)
M. Belhaj (Office National d'Etudes et de Recherches Aerospatiales)
L. Van van Kessel (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
Cornelis W. Hagen (TU Delft - ImPhys/Hagen group)
Christophe Ballif (École Polytechnique Fédérale de Lausanne)
N. Wyrsch (École Polytechnique Fédérale de Lausanne)
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Abstract
Amorphous silicon based microchannel plates are being developed to overcome performance limits of conventional microchannel plates. They offer a new flexibility and ease of fabrication. A comprehensive AMCP model is being constructed to analyze the performances of AMCPs. It includes Monte Carlo simulation of secondary electron emission distribution as a function of energy and angles and finite element analysis multiphysics software to compute electron trajectories. The paper presents the results of Monte Carlo simulations of secondary emission functions in silicon and the high secondary emissive material Al2O3. We discuss the gain and potential performance as a function of geometry of such devices. The validity of the Eberhardt model for the analysis of AMCPs is also addressed.