Analysis of Si-Ti and Si-TiN interface after 300°C or 400°C alloying
Conference Paper
(2007)
Author(s)
G Lorito (External organisation)
L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)
H. Schellevis (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
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https://resolver.tudelft.nl/uuid:052b7a03-7be9-4e2d-b93f-05f90270657b
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Publication Year
2007
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1-4
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