Manufacturing uniform field silicon drift detector using double boron layer
Journal Article
(2015)
Authors
Negin Golshani (TU Delft - Electronic Components, Technology and Materials)
CIM Beenakker (TU Delft - Electrical Engineering, Mathematics and Computer Science)
Ryoichi Ishihara (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://doi.org/10.1016/j.nima.2015.05.011
TU Delft Repository resolver:
https://resolver.tudelft.nl/0a8bd93d-537e-4ed4-bd04-97642addc269
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Publication Year
2015
Language
English
Research Group
Electronic Components, Technology and Materials
Issue number
September
Volume number
794
Pages (from-to)
206-214
DOI:
https://doi.org/10.1016/j.nima.2015.05.011
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