Development of deep dry etching for intelligent mocromachine devices.
Report
(2001)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
MF Craciun (TU Delft - QN/Fysics of NanoElectronics)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
P.J. French (TU Delft - Electronic Instrumentation)
Research Group
QN/Kavli Nanolab Delft
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Publication Year
2001
Research Group
QN/Kavli Nanolab Delft
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