Enhancing the activation of silicon carbide tracer particles for PEPT applications using gas-phase deposition of alumina at room temperature and atmospheric pressure

None, None; None, None; None, None; None, None; None, None; None, None; None, None; None, None; None, None

Enhancing the activation of silicon carbide tracer particles for PEPT applications using gas-phase deposition of alumina at room temperature and atmospheric pressure

Journal Article (2016)

Author(s)

D Valdesueiro Gonzalez (TU Delft - ChemE/Product and Process Engineering)

P Garcia-Trinanes (University of Surrey)

GMH Meesters (TU Delft - ChemE/Product and Process Engineering)

MT Kreutzer (TU Delft - ChemE/Product and Process Engineering)

J Gargiuli (University of Birmingham)

TW Leadbetter (University of Birmingham)

DJ Parker (University of Birmingham)

JPK Seville (University of Surrey)

JR van Ommen (TU Delft - ChemE/Product and Process Engineering)

DOI related publication

https://doi.org/10.1016/j.nima.2015.10.111 Final published version

To reference this document use

https://resolver.tudelft.nl/uuid:1636b947-78fd-4fc8-b0a9-cbff377d6e41

More Info

expand_more

Publication Year

2016

Language

English

Volume number

807

Pages (from-to)

108-113

Downloads counter

32

Collections

Institutional Repository

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Files

Postprint_Valdesueiro_2016_Enh... (pdf)

(pdf | 1.26 Mb)

- Embargo expired in 18-11-2017