DV

David Valdesueiro Gonzalez

16 records found

Authored

The feasibility of gas phase deposition using a Ti alkoxide precursor for precise surface modification of catalysts was demonstrated by modifying a mesoporous alumina support with a Ti oxide overcoat. Titanium tetra-isopropoxide yields a Ti oxide layer that covers homogeneousl ...

This work investigated the suppression of photocatalytic activity of titanium dioxide (TiO2) pigment powders by extremely thin aluminum oxide (Al2O3) films deposited via an atomic-layer-deposition-type process using trimethylaluminum (TMA) and H2O as precursors. The deposition wa ...

Performance improvement by alumina coatings on Y3Al5O12

Ce3+ phosphor powder deposited using atomic layer deposition in a fluidized bed reactor

To improve the thermal stability, Al2O3 has been successfully coated on a Y3Al5O12:Ce3+ (YAG:Ce) phosphor powder host by using the Atomic Layer Deposition (ALD) approach in a fluidized bed reactor. Transmission ...

Stability of quantum dot (QD) films is an issue of concern for applications in devices such as solar cells, LEDs, and transistors. This paper analyzes and optimizes the passivation of such QD films using gas-phase deposition, resulting in enhanced stability. Crucially, we deposit ...