Mechanical Reliability of CVD-Copper Thin Films
Journal Article
(1997)
Author(s)
JF Jongste (External organisation)
JP Lokker (TU Delft - QN/Fysics of NanoElectronics)
GCAM Janssen (TU Delft - OLD Metals Processing, Microstructures and Properties)
S Radelaar (TU Delft - OLD Metals Processing, Microstructures and Properties)
J Torres (External organisation)
J Palleau (External organisation)
Research Group
QN/Fysics of NanoElectronics
To reference this document use:
https://resolver.tudelft.nl/uuid:246b17f1-3034-47d1-bfe6-80fde3b4cea2
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Publication Year
1997
Research Group
QN/Fysics of NanoElectronics
Volume number
33
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