High quality factor RF inductors using low loss conductor featured with skin effect suppression for standard CMOS/BiCMOS

I Iramnaaz (External organisation)

T Sandoval (External organisation)

Y Zhuang (TU Delft - Old - EWI Ch. Integrated Sensing Devices)

H. Schellevis (TU Delft - Electronic Components, Technology and Materials)

B Rejaei (External organisation)