Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
Journal Article
(2009)
Author(s)
AE Grigorescu (TU Delft - ImPhys/Charged Particle Optics)
Cornelis W. Hagen (TU Delft - ImPhys/Charged Particle Optics)
Research Group
ImPhys/Charged Particle Optics
To reference this document use:
https://resolver.tudelft.nl/uuid:2a44bb71-d640-4745-8623-6c798389c66d
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Publication Year
2009
Research Group
ImPhys/Charged Particle Optics
Volume number
20
Pages (from-to)
292001-292001
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