Preparation of large, location-controlled Si grains by excimer-laser crystallization of a-Si films sputtered at 100C
Conference Paper
(2007)
Author(s)
M He (TU Delft - Electronic Components, Technology and Materials)
R Ishihara (TU Delft - Electronic Components, Technology and Materials)
CIM Beenakker (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:306393b5-86fe-43f8-a943-988efc44462c
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Publication Year
2007
Research Group
Electronic Components, Technology and Materials
Pages (from-to)
1-4
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