Characterization of pure boron depositions integrated in silicon diodes for nanometer deep junction applications
Doctoral Thesis
(2010)
Author(s)
F Sarubbi (TU Delft - Electronic Components, Technology and Materials)
Research Group
Electronic Components, Technology and Materials
To reference this document use:
https://resolver.tudelft.nl/uuid:3216a51c-d85d-4d02-ac21-c571c7820140
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Publication Year
2010
Language
English
Research Group
Electronic Components, Technology and Materials
ISBN (print)
978-90-8570-436-2
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