Investigation of hydrogen silsesquioxane E-beam resist as etching mask for cryogenic silicon etching
Conference Paper
(2008)
Author(s)
C. Yang (TU Delft - Electronic Instrumentation)
Gregory Pandraud (TU Delft - Electronic Instrumentation)
K Babaei Gavan (TU Delft - QN/Mol. Electronics & Devices)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Paddy French (TU Delft - Electronic Instrumentation)
Research Group
Electronic Instrumentation
To reference this document use:
https://resolver.tudelft.nl/uuid:328253cb-debc-4905-a8d3-40a1440fe2ac
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Publication Year
2008
Research Group
Electronic Instrumentation
Pages (from-to)
1088-1092
ISBN (print)
978-90-9023470
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