Tunable Photodetectors via In Situ Thermal Conversion of TiS3 to TiO2

Journal Article (2020)
Author(s)

Foad Ghasemi (University of Kurdistan, Sanandaj, Instituto Madrilenõ de Estudios Avanzados en Nanociencia (IMDEA-Nanociencia))

Riccardo Frisenda (Instituto de Ciencia de Materiales de Madrid (ICMM))

Eduardo Flores (Campus de Cantoblanco)

Nikos Papadopoulos (TU Delft - QRD/Goswami Lab, Kavli institute of nanoscience Delft)

Robert Biele (University of the Basque Country, Technische Universität Dresden)

David Perez de Lara (Instituto Madrilenõ de Estudios Avanzados en Nanociencia (IMDEA-Nanociencia))

Herre S.J. van der Zant (TU Delft - QN/van der Zant Lab, Kavli institute of nanoscience Delft)

Kenji Watanabe (National Institute for Materials Science)

Andres Castellanos-Gomez (Instituto de Ciencia de Materiales de Madrid (ICMM))

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DOI related publication
https://doi.org/10.3390/nano10040711 Final published version
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Publication Year
2020
Language
English
Issue number
4
Volume number
10
Article number
711
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Abstract

In two-dimensional materials research, oxidation is usually considered as a common source for the degradation of electronic and optoelectronic devices or even device failure. However, in some cases a controlled oxidation can open the possibility to widely tune the band structure of 2D materials. In particular, we demonstrate the controlled oxidation of titanium trisulfide (TiS3), a layered semicon-ductor that has attracted much attention recently thanks to its quasi-1D electronic and optoelectron-ic properties and its direct bandgap of 1.1 eV. Heating TiS3 in air above 300 °C gradually converts it into TiO2, a semiconductor with a wide bandgap of 3.2 eV with applications in photo-electrochemistry and catalysis. In this work, we investigate the controlled thermal oxidation of indi-vidual TiS3 nanoribbons and its influence on the optoelectronic properties of TiS3-based photodetec-tors. We observe a step-wise change in the cut-off wavelength from its pristine value ~1000 nm to 450 nm after subjecting the TiS3 devices to subsequent thermal treatment cycles. Ab-initio and many-body calculations confirm an increase in the bandgap of titanium oxysulfide (TiO2-xSx) when in-creasing the amount of oxygen and reducing the amount of sulfur.