Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation

Journal Article (2003)
Author(s)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

G Marcos (External organisation)

A Rhallabi (External organisation)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2003
Research Group
QN/Kavli Nanolab Delft
Issue number
10
Volume number
94
Pages (from-to)
6311-6318

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