Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation
Journal Article
(2003)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
G Marcos (External organisation)
A Rhallabi (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:391d280b-b667-4433-8166-de1ba5dd6e1b
More Info
expand_more
expand_more
Publication Year
2003
Research Group
QN/Kavli Nanolab Delft
Issue number
10
Volume number
94
Pages (from-to)
6311-6318
No files available
Metadata only record. There are no files for this record.