Modeling of fluorine-based high-density plasma etching of anisotropic silicon trenches with oxygen sidewall passivation

Journal article (2003)

Authors

MA Blauw QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
G Marcos External organisation
A Rhallabi External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2003

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft