Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching.
Conference Paper
(2000)
Author(s)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
T Zijlstra (TU Delft - QN/Kavli Nanolab Delft)
RA Bakker (TU Delft - Old - sect Kramers Laboratory (MSP/FT))
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:3a11369f-d166-4275-b286-a166d768cf3f
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Publication Year
2000
Research Group
QN/Kavli Nanolab Delft
Pages (from-to)
3453-3461
ISBN (print)
1-56396-969-6
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