Kinetics and crystal orientation dependence in high aspect ratio silicon dry etching.

Conference paper (2000)

Authors

MA Blauw QN/Kavli Nanolab Delft - AS
T Zijlstra QN/Kavli Nanolab Delft - AS
RA Bakker Old - sect Kramers Laboratory (MSP/FT)
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
More Info
expand_more

Published Date

2000

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft