Characterization of Thermal Expansion Coefficient of LPCVD Polycrystalline SiC Thin Films Using Two Section V-beam Actuators
S. Thomas (TU Delft - EKL-Users)
A. Jovic (TU Delft - Electronic Components, Technology and Materials)
B. Morana (TU Delft - EKL-Users)
F. Buja (TU Delft - Micro and Nano Engineering)
A. Gkouzou (TU Delft - Micro and Nano Engineering)
G. Pandraud (TU Delft - EKL Processing)
P.M. Sarro (TU Delft - Electronic Components, Technology and Materials)
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Abstract
In this paper we present the characterization of the coefficient of thermal expansion (CTE) of in-situ doped polycrystalline SiC thin films, obtained by low pressure chemical vapor deposition (LPCVD). The material is characterized using V-beam actuators on which the temperature coefficient of resistance (TCR) and the in-plane displacement versus current are measured. A CTE value of 4.3 ± 0.4 ppm/K is obtained in the temperature region of 20°C to 300°C. This value is used in a finite element modeling (FEM) simulation of vertical SiC-SiO2 bimorph beams. For an actuator length of 700 μm, width of 100 μm and layer thickness of 2 μm, a displacement up to 200 μm can be obtained.
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