Deep reactive ion etching in through-silicon via technology

Book chapter (2007)

Authors

F Roozeboom External organisation
MA Blauw QN/Kavli Nanolab Delft - AS
Y Lamy External organisation
E van Grunsven External organisation
W Dekkers External organisation
JF Verhoeven External organisation
F van den Heuvel External organisation
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
WMM Kessels External organisation
MCM van de Sanden External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2007

Language

Undefined/Unknown

Reuse Rights

Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.

Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft