Deep reactive ion etching in through-silicon via technology

F Roozeboom (External organisation)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

Y Lamy (External organisation)

E van Grunsven (External organisation)

W Dekkers (External organisation)

JF Verhoeven (External organisation)

F van den Heuvel (External organisation)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

WMM Kessels (External organisation)

MCM van de Sanden (External organisation)