Deep reactive ion etching in through-silicon via technology
F Roozeboom (External organisation)
MA Blauw (TU Delft - QN/Kavli Nanolab Delft)
Y Lamy (External organisation)
E van Grunsven (External organisation)
W Dekkers (External organisation)
JF Verhoeven (External organisation)
F van den Heuvel (External organisation)
EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)
WMM Kessels (External organisation)
MCM van de Sanden (External organisation)
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