Deep reactive ion etching in through-silicon via technology

Book Chapter (2007)
Author(s)

F Roozeboom (External organisation)

MA Blauw (TU Delft - QN/Kavli Nanolab Delft)

Y Lamy (External organisation)

E van Grunsven (External organisation)

W Dekkers (External organisation)

JF Verhoeven (External organisation)

F van den Heuvel (External organisation)

EWJM van der Drift (TU Delft - QN/Kavli Nanolab Delft)

WMM Kessels (External organisation)

MCM van de Sanden (External organisation)

Research Group
QN/Kavli Nanolab Delft
More Info
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Publication Year
2007
Research Group
QN/Kavli Nanolab Delft
Bibliographical Note
Nog niet eerder opgevoerd@en
Pages (from-to)
47-91
ISBN (print)
978-3-527-32034-9

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