Electron-beam patterned calibration structures for structured illumination microscopy
Sangeetha Hari (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
Johan A. Slotman (Erasmus MC)
Yoram Vos (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
Christian Floris (Student TU Delft)
Wiggert A. van Cappellen (Erasmus MC)
C. W. Hagen (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
Sjoerd Stallinga (TU Delft - ImPhys/Imaging Physics)
Adriaan B. Houtsmuller (Erasmus MC)
Jacob P. Hoogenboom (TU Delft - ImPhys/Microscopy Instrumentation & Techniques)
More Info
expand_more
Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons.
Abstract
Super-resolution fluorescence microscopy can be achieved by image reconstruction after spatially patterned illumination or sequential photo-switching and read-out. Reconstruction algorithms and microscope performance are typically tested using simulated image data, due to a lack of strategies to pattern complex fluorescent patterns with nanoscale dimension control. Here, we report direct electron-beam patterning of fluorescence nanopatterns as calibration standards for super-resolution fluorescence. Patterned regions are identified with both electron microscopy and fluorescence labelling of choice, allowing precise correlation of predefined pattern dimensions, a posteriori obtained electron images, and reconstructed super-resolution images.
help_outline