Design rules for Patterning in Deep Cavities Formed by TMAH-etching of Si
Conference Paper
(2008)
Author(s)
L Gu (TU Delft - Old - EWI Sect. ECTM)
W.H.A. Wien (TU Delft - Electronic Components, Technology and Materials)
L. K. Nanver (TU Delft - Electronic Components, Technology and Materials)
Research Group
Old - EWI Sect. ECTM
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https://resolver.tudelft.nl/uuid:3f1c6205-8732-4a43-be4c-413c027cb2c8
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Publication Year
2008
Research Group
Old - EWI Sect. ECTM
Pages (from-to)
472-475
ISBN (print)
978-90-73461-56-7
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