Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV

Report (1999)
Author(s)

I Montilla (External organisation)

A Rivera (TU Delft - Old - Section Defects in Materials)

A van Veen (TU Delft - Old - Section Defects in Materials)

Research Group
Old - Section Defects in Materials
More Info
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Publication Year
1999
Research Group
Old - Section Defects in Materials

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