Helium depth profiles in silicon and silicon based materials: implantation energies from 20 to 400 keV
Report
(1999)
Author(s)
I Montilla (External organisation)
A Rivera (TU Delft - Old - Section Defects in Materials)
A van Veen (TU Delft - Old - Section Defects in Materials)
Research Group
Old - Section Defects in Materials
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https://resolver.tudelft.nl/uuid:40897fb0-1078-44fc-9d03-278584b81a57
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Publication Year
1999
Research Group
Old - Section Defects in Materials
Bibliographical Note
IRI-131-99-027@en
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