High resolution reactive ion etching of GaN and etch-induced effects.
Journal Article
(1999)
Author(s)
R Cheung (External organisation)
RJ Reeves (External organisation)
B Rong (TU Delft - QN/Kavli Nanolab Delft)
SA Brown (External organisation)
EJM Fakkeldij (External organisation)
E.W.J.M. van der Drift (TU Delft - QN/Kavli Nanolab Delft)
M Kamp (External organisation)
Research Group
QN/Kavli Nanolab Delft
To reference this document use:
https://resolver.tudelft.nl/uuid:41a70e6c-079d-4bf5-aacb-21d293f2adea
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Publication Year
1999
Research Group
QN/Kavli Nanolab Delft
Issue number
issue 6
Volume number
17
Pages (from-to)
2759-2763
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